Granted Patent
Utility
US 6,830,650 · App. 10/194,526
Wafer probe for measuring plasma and surface characteristics in plasma processing environments
Inventors:
Gregory A. Roche, Leonard Mahoney, Daniel Carter, Steven Roberts
Patented Case
View Patent ↗
Granted: Dec 14, 2004
Filed: Jul 12, 2002
Inventors
Gregory A. Roche
Leonard Mahoney
Daniel Carter
Steven Roberts
Assignee (at issue)
Advanced Energy Industries, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.