Granted Patent
Utility
US 6,830,873 · App. 10/233,701
Method for adjusting and expposing the second level of a phase-shift mask
Inventors:
Gernot Goedl, Dirk Löffelmacher
Patented Case
View Patent ↗
Granted: Dec 14, 2004
Filed: Sep 3, 2002
Inventors
Gernot Goedl
Dirk Löffelmacher
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.