IP Library Granted Patent US 6,835,245
Granted Patent Utility
US 6,835,245 · App. 09/883,922

Method of manufacturing epitaxial wafer and method of producing single crystal as material therefor

Inventors: Toshiaki Ono, Tadami Tanaka, Eiichi Asayama, Hideshi Nishikawa, Masataka Horai
Patented Case View Patent ↗
Granted: Dec 28, 2004 Filed: Jun 20, 2001
Inventors
Toshiaki Ono
Tadami Tanaka
Eiichi Asayama
Hideshi Nishikawa
Masataka Horai
Assignee (at issue)
Sumitomo Mitsubishi Silicon Corporation

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Quick Facts
Patent No.
US 6,835,245
App. No.
09/883,922
Filed
2001-06-20
Granted
2004-12-28
Kind
B2