IP Library Granted Patent US 7,280,933
Granted Patent B2
US 7,280,933 · App. 11/027,921 · Granted Oct 9, 2007

Method and apparatus for forming a pattern, device and electronic apparatus

Assignee: Seiko Epson Corporation
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Quick Facts
Patent No.
US 7,280,933
App. No.
11/027,921
Granted
Oct 9, 2007
Kind
B2
Abstract

A method for forming a pattern on a substrate, including the steps of: ejecting liquid drops from an ejection head having nozzles onto a reference plate on which a plurality of target positions are defined, the target positions being arranged in at least one row; detecting an amount of a displacement between the target positions and the positions at which the liquid drops have actually landed; determining a relative positional error relative to the ejection head for each of the at least one row of the target positions based on the amount of the displacement; determining a correction value for each of the at least one row based on the relative positional error; and sequentially changing a relative position of the substrate and the ejection head based on the corrections values when the liquid drops are being ejected onto the substrate.

Claims (6)

1. A method for forming a pattern on a substrate, comprising the steps of:

ejecting liquid drops from an ejection head having nozzles onto a reference plate on which a plurality of blocks are defined, a plurality of target positions being defined in each block, the target positions being arranged in a plurality of rows in a predetermined pattern;

detecting an amount of a displacement between the target positions and the positions at which the liquid drops have actually landed; determining a relative positional error relative to the ejection head for each of the plurality of rows of the target positions based on the amount of the displacement; determining a correction value for each of the plurality of rows based on the relative positional error; and sequentially changing a relative position of the substrate and the ejection head based on the correction values while ejecting the liquid drops onto the substrate, wherein the target positions are based on a plurality of marks formed on the reference plate; and wherein a spacing between the target positions in a first direction is approximately twice a spacing between nozzle holes of the ejection head.

2. A device that is manufactured using the method for forming a pattern on a substrate according to claim 1 .

3. The method according to claim 1 , wherein the marks are of approximately the same size as that of the liquid drops ejected on the reference plate from the ejection head.

4. The method according to claim 1 , wherein the predetermined pattern is a polka dot pattern.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 2, 2016
From: SEIKO EPSON CORPORATION
To: TOKYO ELECTRON LIMITED
Reel/Frame 038769/0522 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 18, 2005
From: NAGAE, NOBUAKI
To: SEIKO EPSON CORPORATION
Reel/Frame 016094/0031 →
Priority Claims (1)
JP 2004-007904 · Jan 15, 2004 · national
Continuity (1)
Related Publication 20050177343A1 · Aug 11, 2005