Magnetic head coil structure and method for manufacturing the same
View Patent ↗A Damascene process is provided for manufacturing a coil structure for a magnetic head. During the manufacturing process, an insulating layer is initially deposited after which a photoresist layer is deposited. A silicon dielectric layer is then deposited on the photoresist layer. After masking the silicon dielectric layer, at least one channel is etched in the photoresist layer and the silicon dielectric layer. Then, a conductive seed layer is deposited in the at least one channel. The at least one channel is then ready to be filled with a conductive material and chemically/mechanically polished to define a coil structure.
1. A coil structure formed during the process of manufacturing a magnetic head, comprising:
an insulating layer;
a photoresist layer deposited on the insulating layer;
a silicon dielectric layer deposited on the photoresist layer, the silicon dielectric layer having at least one channel formed therein;
a conductive material formed in the at least one channel to define a coil structure;
wherein a grain size of the conductive material is less than half of a smallest dimension of the at least one channel.
2. The coil structure as recited in claim 1 , wherein the insulating layer includes Al 2 O 3 .
3. The coil structure as recited in claim 1 , further comprising a conductive seed layer, wherein the conductive seed layer includes Cu.
4. The coil structure as recited in claim 1 , wherein the conductive material includes Cu.
5. The coil structure as recited in claim 1 , wherein the grain size of the conductive material is less than 0.25 um but greater than zero.
6. The coil structure as recited in claim 1 , further comprising a conductive seed layer, wherein a resistivity of the conductive seed layer is less than or equal to 8.3 micro-ohm/cm.
7. The coil structure as recited in claim 1 , wherein the silicon dielectric layer includes SiO 2 .
8. The coil structure as recited in claim 1 , wherein the at least one channel includes a slope greater than one (1) but less than infinity.
9. The coil structure as recited in claim 8 , wherein the slope of the at least one channel facilitates depositing of a conductive seed layer and the conductive material.
10. The coil structure as recited in claim 8 , wherein a reactive ion milling process defines the slope.
11. The coil structure as recited in claim 8 , wherein side walls of the at least one channel taper inwardly from a top to a bottom of the at least one channel to define the slope.
12. The coil structure as recited in claim 1 , wherein an aspect ratio of the at least one channel is at least 7.
13. The coil structure as recited in claim 1 , wherein the channels are formed by masking, wherein the masking includes depositing another photoresist layer.
14. The coil structure as recited in claim 1 , wherein at least a portion of the silicon dielectric layer has been removed.
15. The coil structure as recited in claim 14 , wherein the silicon dielectric layer has been removed by chemical-mechanical polishing (CMP).
16. The coil structure as recited in claim 14 , wherein the silicon dielectric layer has been removed by reactive ion plasma etching.
17. The coil structure as recited in claim 1 , and further comprising an adhesion promoter layer between the silicon dielectric layer and the photoresist layer.
18. The coil structure as recited in claim 1 , wherein the coil structure includes a P2 pole tip structure.
19. A disk drive system, comprising:
a magnetic recording disk;
a magnetic head including a coil structure as recited in claim 1 ;
an actuator for moving the magnetic head across the magnetic recording disk so the magnetic head may access different regions of the magnetic recording disk; and
a controller electrically coupled to the magnetic head.
20. A magnetic head coil structure manufactured utilizing a process, comprising:
depositing an insulating layer;
depositing a photoresist layer on the insulating layer;
depositing a silicon dielectric layer on the photoresist layer;
masking the silicon dielectric layer;
etching at least one channel in the photoresist layer and the silicon dielectric layer;
depositing a conductive seed layer in the at least one channel; and
filling the at least one channel with a conductive material to define a coil structure;
wherein a grain size of the conductive material is less than half of a smallest dimension of the at least one channel.
21. A disk drive system, comprising:
a magnetic recording disk;
a magnetic head including a coil structure as recited n claim 20 ;
an actuator for moving the magnetic head across the magnetic recording disk so the magnetic head may access different regions of the magnetic recording disk; and
a controller electrically coupled to the magnetic head.