IP Library Granted Patent US 7,327,082
Granted Patent B2
US 7,327,082 · App. 10/617,227 · Granted Feb 5, 2008

Substrate assembly for gas discharge panel having dielectric layer comprising laminate of organic dielectric layer and inorganic dielectric layer, and gas discharge panel

Assignee: Hitachi, Ltd.
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Quick Facts
Patent No.
US 7,327,082
App. No.
10/617,227
Granted
Feb 5, 2008
Kind
B2
Abstract

A substrate assembly for a gas discharge panel, comprising a dielectric layer and a protective layer of MgO being formed in this order on a substrate having electrodes, wherein the dielectric layer is a laminate of an organic dielectric layer and an inorganic dielectric layer in this order from a side of the substrate.

Claims (15)

1. A substrate assembly for a gas discharge panel, comprising:

an organic polymer dielectric layer covering a plurality of electrodes arranged on the substrate;

an inorganic dielectric layer provided on the organic polymer dielectric layer, said inorganic dielectric layer consisting of a material selected from a group of SiO 2 , Al 2 O 3 , AlN, Si 3 N 4 and SiC; and

a protective layer of MgO having a porous body of a thickness of 0.5-1.5 μm,

wherein the protective layer of MgO is prevented from direct contact with the organic polymer dielectric layer by the inorganic dielectric layer.

2. The substrate assembly for a gas discharge panel of claim 1 , wherein the organic polymer dielectric layer is made of a material selected from polyimide, polyimide imide, polysiloxane and polysilazane.

3. The substrate assembly for a gas discharge panel of claim 2 , wherein the organic polymer dielectric layer is made of a material selected from polysiloxane and polysilazane each having a side chain selected from alkyl, alkoxy and aryl.

4. The substrate assembly for a gas discharge panel of claim 1 , wherein the inorganic dielectric layer is made of a metal oxide having a smaller bond distance between an oxygen atom and a metal atom than the wavelength of an atom vacuum ultra violet ray.

5. The substrate assembly for a gas discharge panel of claim 1 , wherein the organic polymer dielectric layer has a smaller dielectric constant than that of the inorganic dielectric layer.

6. The substrate assembly of claim 1 , wherein the organic polymer dielectric layer has a thickness of 5-20 μm and the inorganic dielectric layer has a thickness of 0.5-2 μm.

7. A gas discharge panel, comprising:

a substrate assembly as disclosed in claim 1 disposed on a front side of the panel as a front substrate assembly;

a rear substrate assembly facing the front substrate assembly; and

a discharge space formed between the front and rear substrate assemblies,

wherein the rear substrate assembly is provided with barrier ribs for defining the discharge space and phosphors, the barrier ribs being formed on a substrate having electrodes, the phosphors being formed on side walls of the barrier ribs and on the substrate defined by the barrier ribs.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 25, 2018
From: HITACHI MAXELL, LTD.
To: MAXELL, LTD.
Reel/Frame 045142/0208 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 25, 2013
From: HITACHI PLASMA PATENT LICENSING CO., LTD.
To: HITACHI CONSUMER ELECTRONICS CO., LTD.
Reel/Frame 030074/0077 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 29, 2008
From: HITACHI LTD.
To: HITACHI PLASMA PATENT LICENSING CO., LTD.
Reel/Frame 021785/0512 →
TRUST AGREEMENT REGARDING PATENT RIGHTS, ETC. DATED JULY 27, 2005 AND MEMORANDUM OF UNDERSTANDING REGARDING TRUST DATED MARCH 28, 2007 Recorded Apr 13, 2007
From: HITACHI LTD.
To: HITACHI PLASMA PATENT LICENSING CO., LTD.
Reel/Frame 019147/0847 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 23, 2005
From: FUJITSU LIMITED
To: HITACHI, LTD.
Reel/Frame 017105/0910 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 11, 2003
From: HASEGAWA, MINORU; TOYODA, OSAMU
To: FUJITSU LIMITED
Reel/Frame 014276/0899 →
Priority Claims (1)
JP 2002-214176 · Jul 23, 2002 · national
Continuity (1)
Related Publication 20040017155A1 · Jan 29, 2004