Gallium nitride material transistors and methods associated with the same
View Patent ↗Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
1. A device adapted to receive an input signal and to transmit an output signal, the device comprising:
at least one transistor structure to receive the input signal, the at least one transistor including at least one active region formed in a gallium nitride material region, the at least one transistor structure being adapted to amplify the input signal to form the output signal, wherein the output signal, when transmitted, has an adjacent channel power ratio (ACPR) of less than or equal to −20 dBc.
2. The device of claim 1 , wherein the at least one transistor structure includes a source electrode, a gate electrode and a drain electrode associated with the at least one active region.
3. The device of claim 1 , wherein the device has a power density of between 0.1 W/mm and 10 W/mm.
4. The device of claim 2 , wherein the gate electrode receives the input signal and the amplified signal is provided at the drain electrode.
5. The device of claim 1 , wherein the input signal is a W-CDMA modulated signal and the output signal is transmitted in accordance with the W-CDMA standard.
6. The device of claim 1 , wherein the at least one transistor structure comprises a plurality of transistor structures.
7. The device of claim 1 , wherein the at least one transistor structure comprises a silicon substrate, wherein the gallium nitride material region is formed on the silicon substrate.
8. The device of claim 1 , wherein the input signal is a radio frequency (RF) signal and the at least one transistor operates as a class AB amplifier.
9. A method of generating an output signal for wireless transmission, the method comprising:
receiving an input signal comprising information to be transmitted;
amplifying the input signal via at least one transistor structure having at least one active region formed in a gallium nitride material region to provide the output signal; and
transmitting the output signal such that the output signal has an ACPR of less than or equal to −20 dBc.
10. The device of claim 1 , wherein the output signal has an ACPR of less than or equal to −29 dBc.
11. The device of claim 1 , wherein the output signal has an ACPR of between −39 dBc and −45 dBc.
12. The device of claim 1 , wherein the output signal has an ACPR of greater than −45 dBc.
13. The device of claim 1 , wherein the gain is greater than or equal to 5 dB.
14. The device of claim 1 , wherein the gain is between 12 dB and 15 dB.
15. The device of claim 1 , wherein the output signal, when transmitted, has an adjacent channel power ratio (ACPR) of less than or equal to −20 dBc at a device efficiency of 22% to 30%.
16. The device of claim 1 , wherein the device has a power density of 0.1 W/mm and 10 W/mm, a gain of greater than or equal to 5 dB, and a device efficiency of greater than 20%.
17. The device of claim 1 , wherein the device has an output power of 10 to 40 W.
18. The device of claim 1 , wherein the gallium nitride material region includes a plurality of gallium nitride material layers.
19. The device of claim 7 , wherein the at least one transistor structure comprises a compositionally-graded transition layer between the silicon substrate and the gallium nitride material region.