IP Library Granted Patent US 7,407,421
Granted Patent B2
US 7,407,421 · App. 10/993,812 · Granted Aug 5, 2008

Light source, optical pickup, and electronic apparatus

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Quick Facts
Patent No.
US 7,407,421
App. No.
10/993,812
Granted
Aug 5, 2008
Kind
B2
Abstract

A light source of the present invention includes: a semiconductor light emitting device which has a light emitting face and emits light from part of the light emitting face; a container which has a light transmitting window for transmitting the light and accommodates the semiconductor light emitting device; and a gettering portion for performing gettering of a material containing at least one of carbon and silicon. The gettering portion is positioned, in the container, in a region other than the part of the light emitting face of the semiconductor light emitting device.

Claims (15)

1. A fabrication method of a light source comprising the steps of:

providing a semiconductor light emitting device which has a light emitting face and emits light from a part of the light emitting face;

providing a container which has a light transmitting window for transmitting the light and accommodates the semiconductor light emitting device;

accommodating the semiconductor light emitting device in the container, thereby blocking the semiconductor light emitting device from the air; and

performing gettering of a material containing at least one of carbon and silicon, by irradiating with light a region that is positioned in the container, and the region being positioned other than the part of the light emitting face of the semiconductor light emitting device.

2. The fabrication method of claim 1 , wherein a wavelength of light with which the irradiation is performed in the gettering step is 450 nm or less.

3. The fabrication method of claim 2 , wherein the irradiation with light is performed by using one of an Hg lamp, a blue LED, a blue laser, an ultraviolet LED, and an ultraviolet laser.

4. The fabrication method of claim 1 , wherein the semiconductor light emitting device is formed from a III-V group nitride semiconductor material.

5. The fabrication method of claim 1 , wherein the material containing the at least one of carbon and silicon is included in an atmosphere in the container.

6. The method of claim 1 , wherein the semiconductor light emitting device includes:

a substrate;

a multilayer structure including a first conductive-type cladding layer, an active layer, and a second conductive-type cladding layer, the multilayer structure being formed on the substrate;

a main current confinement structure for injecting a carrier into a first region of the active layer; and

a sub current confinement structure for injecting a carrier into a second region of the active layer, wherein the step of performing gettering includes irradiating the region with light from the second region of the active layer.

7. The method of claim 1 , wherein the step of performing gettering includes irradiating the region with light from the outside of the container.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 27, 2020
From: PANASONIC CORPORATION
To: PANASONIC SEMICONDUCTOR SOLUTIONS CO., LTD.
Reel/Frame 052755/0917 →
CHANGE OF NAME Recorded Nov 20, 2008
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 021930/0876 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 7, 2005
From: KIDOGUCHI, ISAO; KITAOKA, YASUO; YAJIMA, HIROYOSHI; ITO, KEIJI; ISHIBASHI, AKIHIKO; HASEGAWA, YOSHIAKI; MIZUUCHI, KIMINORI
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 016229/0234 →