Pupil improvement of incoherent imaging systems for enhanced CD linearity
A pattern generator may include an electromagnetic radiation source and an optical system. The electromagnetic radiation source may emit electromagnetic radiation to create a pattern on a workpiece. The optical system may include an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source and may be configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern.
1. A pattern generator comprising:
an electromagnetic radiation source for emitting electromagnetic radiation to create a pattern on a workpiece; and
an optical system including an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source; wherein
the optical system is configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern, and
the apodized electromagnetic radiation has a Gaussian shape.
2. The pattern generator of claim 1 , wherein the optical system is a partially incoherent imaging system.
3. The pattern generator of claim 2 , wherein the partially incoherent imaging system uses immersion.
4. The pattern generator of claim 2 , wherein the partially incoherent imaging system has multiple raster-scanning beams.
5. The pattern generator of claim 1 , wherein the optical system further includes a system aperture for creating a spot function with less than 2 percent outside of a center lobe component of the electromagnetic radiation.
6. The pattern generator of claim 1 , wherein the optical system further includes a system aperture having a numerical aperture and a critical dimension and critical dimension linearity error for the pattern generator is determined based on the wavelength of the electromagnetic radiation and a size of the numerical aperture.
7. The pattern generator of claim 1 , wherein the electromagnetic radiation is a light beam with a polarization that varies across an exit pupil.
8. The pattern generator of claim 7 , wherein the modulator is one of an acousto-optical or electro-optical modulator.
9. The pattern generator of claim 8 , wherein the optical system further includes a filter for filtering the electromagnetic radiation such that the apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern.
10. The pattern generator of claim 9 , wherein the filter is an amplitude pupil filter having an aperture size determined based on a wavelength of the light beam.
11. The pattern generator of claim 9 , wherein the light beam has a wavelength of about 413 nm, about 406 nm, about 364 nm, about 257 nm, about 198 nm or about 193 nm.
12. The pattern generator of claim 9 , wherein the light beam has a wavelength greater than, or equal to, about 32 nm.
13. The pattern generator of claim 1 , wherein the optical system further includes,
a first lens positioned such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern,
a modulator modulating electromagnetic radiation emitted from the electromagnetic radiation source to create a pattern,
a scanner for relaying the electromagnetic radiation toward the workpiece, and
a second lens for focusing the electromagnetic radiation such that the electromagnetic radiation impinges on the workpiece to create the pattern.
14. The pattern generator of claim 13 , wherein the light beam has a radially non-monotonic distribution within a pupil of the optical imaging system.
15. The pattern generator of claim 14 , wherein the radially non-monotonic distribution includes concentric rings having higher and lower intensities.
16. The pattern generator of claim 13 , wherein the light beam has a wavelength greater than, or equal to, about 32 nm.
17. The pattern generator of claim 13 , wherein the light beam has a wavelength of about 413 nm, about 406 nm, about 364 nm, about 257 nm, about 198 nm or about 193 nm.
18. The pattern generator of claim 1 , wherein the optical system further includes a spatial light modulator having a plurality of pixels for creating a pattern and for relaying electromagnetic radiation such that the electromagnetic radiation impinges on the workpiece.
19. The pattern generator of claim 18 , wherein the electromagnetic radiation is a light beam.
20. The pattern generator of claim 19 , wherein the light beam has a beamwidth, which is less than about 0.3 times the aperture size.
21. The pattern generator of claim 1 , wherein the electromagnetic radiation is a light beam.
22. An integrated circuit comprising:
a pattern having a line width less than 0.25 microns, the pattern being produced using the pattern generator of claim 1 .
23. The pattern generator of claim 1 , wherein said apodization of the electromagnetic radiation is applied after a system aperture in the optical path of the patent generator.
24. The pattern generator of claim 1 , wherein said apodization is creating a spot function with less than 0.8 percent outside of a center lobe.
25. The pattern generator of claim 1 , wherein said apodization is achieved by introducing at least one additional optical element.
26. The pattern generator of claim 1 , wherein said at least one additional optical element is one of a lens, a filter or an aperture.
27. The pattern generator of claim 1 , wherein said apodization is achieved by rearranging existing optical elements.
28. The pattern generator of claim 1 , wherein the optical system further includes a system aperture having an aperture size providing an apodization sufficient to minimize the smallest line width satisfying plus/minus 40 nm CD linearity error.
29. The patent generator of claim 1 , wherein the optical system further includes a system aperture having an aperture size providing an apodization sufficient to minimize the smallest line width satisfying plus/minus 20 nm CD linearity error.
30. The pattern generator of claim 1 , wherein the optical system further includes a system aperture having an aperture size providing an apodization sufficient to minimize the smallest line width satisfying plus/minus 10 nm CD linearity error.
31. The pattern generator of claim 1 , wherein the optical system further includes a system aperture having an aperture size providing an apodization sufficient to minimize the smallest line width satisfying plus/minus 5 nm CD linearity error.
32. A pattern generator comprising:
an electromagnetic radiation source for emitting electromagnetic radiation to create a pattern on a workpiece; and
an optical system including an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source; wherein
the optical system is configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern, and
the optical system further includes a system aperture for creating a spot function with less than 0.8% percent outside of a center lobe component of the electromagnetic radiation.
33. The pattern generator of claim 32 , wherein the system aperture has a numerical aperture greater than or equal to about 0.68.