Semiconductor laser
A semiconductor laser having a double channel ridge structure includes: a ridge; channel portions located on opposite sides of the ridge, sandwiching the ridge, and having an equivalent refractive index lower than the equivalent refractive index of the ridge; and layers defining outside surfaces of the channel portions and, having an equivalent refractive index higher than the equivalent refractive index of the channel portions. The ridge has a flare ridge structure with a width that is widened toward a light outgoing end surface, and the width of the channel portions where the width of the ridge is the narrowest is wider than the channel portions at the light outgoing end surface.
1. A semiconductor laser having a double channel ridge structure, comprising:
a ridge;
channels located on opposite sides of said ridge, sandwiching said ridge, and having an equivalent refractive index lower than the equivalent refractive index of said ridge; and
layers defining outside surfaces of the channels, having an equivalent refractive index higher than the equivalent refractive index of said, wherein
a first part of said ridge includes a flared ridge structure in which width of said ridge increases toward a light output end surface of said ridge structure, and
said channels are wider where the width of said ridge is narrowest than at said light output end surface.
2. The semiconductor laser having a double channel ridge structure according to claim 1 , wherein when
the width of said ridge is T,
the equivalent refractive index of said ridge is n 1 ,
the equivalent refractive index of said channels is n 2 ,
the oscillation wavelength is λ, and
the electric field E at a distant x from the center of said ridge is:
E=A cos( ux )( x≦T/ 2) (1)
E=A cos( uT/ 2)exp(− w (| x|−T/ 2))( x≧T/ 2) (2)
w=u ·tan( u ) (4)
where A represents a predetermined factor, and
the width Wc of the channels where the width of said ridge is the narrowest is determined so that E 2 /E 1 , which is a ratio of electric field E 1 when x=0 to electric field E 2 when x=T/2+Wc, satisfies:
00001≦ E 2 /E 1≦0.01 (5),
so that said semiconductor laser oscillates in a basic mode.
3. The semiconductor laser according to claim 2 , wherein the distance from the center of said ridge to an outside edges of said channels is constant.
4. The semiconductor laser according to claim 1 , wherein the oscillation wavelength is within a range from 601 nm to 700 nm.
5. The semiconductor laser according to claim 1 , wherein the oscillation wavelength is within a range from 701 nm to 900 nm.
6. The semiconductor laser according to claim 1 , wherein the oscillation wavelength is within a range from 330 nm to 600 nm.
7. A semiconductor laser device including a plurality of semiconductor lasers according to claim 1 having different oscillation wavelengths, wherein said plurality of semiconductor lasers are integrated into a chip.
8. The semiconductor laser according to claim 1 , wherein the distance from the center of said ridge to outside edges of said channels is larger where the width of said ridge is narrowest than at said light output end surface.
9. The semiconductor laser according to claim 1 , wherein outside edges and inside edges of respective channels converge along said flared ridge structure where the width of said ridge increases toward said light output end surface.
10. The semiconductor laser according to claim 1 , wherein
a second part of said ridge includes a flared ridge structure in which width of said ridge increases toward an end surface opposite said light output end surface, and
the channels are wider where the width of said ridge is narrowest than at said end surface opposite said light output end surface.