IP Library Granted Patent US 7,791,072
Granted Patent B2
US 7,791,072 · App. 11/269,767 · Granted Sep 7, 2010

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Assignees: Canon Kabushiki Kaisha; Tokyo Institute of Technology
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Quick Facts
Patent No.
US 7,791,072
App. No.
11/269,767
Granted
Sep 7, 2010
Kind
B2
Abstract

An active matrix display comprising a light control device and a field effect transistor for driving the light control device. The active layer of the field effect transistor comprises an amorphous.

Claims (26)

1. An active matrix display comprising:

a light control device; and

a field effect transistor for driving the light control device,

wherein an active layer of the field effect transistor comprises an amorphous oxide of a compound having

(a) a composition when in a crystalline state represented by In 2-x M3 x O 3 (Zn l-y M2 y O) m , wherein M2 is Mg or Ca; M3 is B, Al, Ga or Y; 0≦x≦2; 0≦y≦1; and m is zero or a natural number less than 6, or a mixture of said compounds;

(b) an electron carrier concentration of 10 12 /cm 3 or more and less than 10 18 /cm 3 , wherein an electron mobility of the active layer tends to increase with increasing electron carrier concentration and wherein a current between drain and source terminals of the field effect transistor when no gate voltage is applied is less than 10 microamperes ; and

(c) controlled oxygen defect density resulting from subjecting the amorphous oxide to treatment in an atmosphere containing oxygen at a predetermined pressure upon or after film formation thereof.

2. An active matrix display according to claim 1 , wherein the amorphous oxide additionally contains at least one of Sn and a Group IV element selected from Si, Ge or Zr.

3. An active matrix display according to claim 1 , wherein the amorphous oxide comprises an oxide containing In, Ga, and Zn.

4. An active matrix display according to claim 1 , wherein the light control device contains one of a liquid crystal and an electrophoretic particle.

5. An active matrix display according to claim 4 , wherein the insulation film comprises one of a silicon oxide film and a silicon nitride film.

6. An active matrix display according to claim 1 , wherein the light control device contains a liquid crystal, and has an orientation film and an insulation film arranged in this order from a side of the liquid crystal between the active layer and the liquid crystal.

7. An active matrix display according to claim 1 , wherein the light control device contains a liquid crystal, and has an orientation film and an insulation film arranged in this order from a side of the liquid crystal between a gate electrode of the field effect transistor and the liquid crystal.

8. An active matrix display according to claim 1 , wherein the light control device is arranged on a flexible resin substrate.

9. An active matrix display according to claim 1 , wherein the light control device is arranged on a light transmissive substrate.

10. An active matrix display comprising:

a first electrode;

a second electrode;

a liquid crystal interposed between the first and second electrodes; and

a field effect transistor for driving the liquid crystal,

wherein an active layer of the transistor comprises an amorphous oxide of a compound having

(a) a composition when in a crystalline state represented by In 2-x M3 x O 3 (Zn l-y M2 y O) m , wherein M2 is Mg or Ca; M3 is B, Al, Ga or Y; 0≦x≦2; 0≦y≦1; and m is zero or a natural number less than 6, or a mixture of said compounds;

(b) a carrier concentration of 10 12 /cm 3 or more and less than 10 18 /cm 3 , wherein an electron mobility of the active layer tends to increase with increasing electron carrier concentration, and wherein a current between drain and source terminals of the field effect transistor when no gate voltage is applied is less than 10 microamperes; and

(c) controlled oxygen defect density resulting from subjecting the amorphous oxide a treatment in an atmosphere containing oxygen at a predetermined pressure upon or after film formation thereof.

11. An active matrix display according to claim 10 , wherein the amorphous oxide additionally contains at least one of Sn and a Group IV element selected from Si, Ge or Zr.

12. An active matrix display according to claim 11 , further comprising an orientation film and an insulation film arranged in this order from a side of the liquid crystal between a gate electrode of the field effect transistor and the liquid crystal.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 2, 2013
From: CANON KABUSHIKI KAISHA; TOKYO INSTITUTE OF TECHNOLOGY
To: CANON KABUSHIKI KAISHA; TOKYO INSTITUTE OF TECHNOLOGY; JAPAN SCIENCE AND TECHNOLOGY AGENCY
Reel/Frame 030728/0301 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 3, 2006
From: KUMOMI, HIDEYA; HOSONO, HIDEO; KAMIYA, TOSHIO; NOMURA, KENJI
To: CANON KABUSHIKI KAISHA; TOKYO INSTITUTE OF TECHNOLOGY
Reel/Frame 017524/0472 →
Priority Claims (1)
JP 2004-326682 · Nov 10, 2004 · national
Continuity (1)
Related Publication 20060113536A1 · Jun 1, 2006