Magneto-resistance effect element and magnetic memory device
The invention relates to a magneto-resistance effect element and a magnetic memory device. Lowering the magnetic domain wall movement current and drive at room temperature in a current induction single magnetic domain wall movement phenomenon are achieved. A magneto-resistance effect element is formed by including at least: a magnet wire 1 for forming magnetic domain wall potential 7 binding a single magnetic domain wall 2 ; a magnetic field applying means for generating a magnetic field for introducing the single magnetic domain wall 2 into the magnet wire 1 ; and a drive current applying means for applying the current 3 including a resonance frequency component determined on the basis of the magnetic domain wall potential 7.
1. A magnetic memory device comprising at least:
a magneto-resistive storage element including a first magnet layer provided with two pinning areas on a semiconductor substrate and a second magnet layer having a fixed magnetization direction, the first magnet layer and the second magnet layer laminated through a nonmagnetic middle layer, wherein
a first wiring layer is connected to one end of the first magnet layer while a second wiring layer is connected to the other end of the first magnet layer,
the second magnet layer is connected to a third wiring layer,
a current including a resonance frequency component determined on the basis of the magnetic domain wall potential in the vicinity of the pinning area is let flow between the first wiring and the second wiring to move the single magnetic domain wall bound in the pinning area of the first magnet layer so as to write information and
a voltage is applied between the first wiring and the third wiring to detect a current flowing between the first wiring and the third wiring so as to read out information.
2. The magnetic memory device according to claim 1 , wherein
the pinning area is formed from a magnetic deterioration area formed in the first magnet layer.
3. The magnetic memory device according to claim 2 , wherein
the magnetic deterioration area is formed from an ion injection area.
4. The magnetic memory device according to claim 1 , wherein
the pinning area is formed from a shape defect area formed in the first magnet layer.
5. The magnetic memory device according to claim 4 , wherein
the shape defect area is formed from a narrow area formed in a longitudinal direction of the first magnet layer.
6. The magnetic memory device according to claim 4 , wherein
the shape defect area is formed from a thin area formed in a longitudinal direction of the first magnet layer.
7. The magnetic memory device according to claim 1 , wherein
the nonmagnetic middle layer is formed from a tunnel insulation film.
8. The magnetic memory device according to claim 1 , wherein
the nonmagnetic middle layer is formed from a nonmagnetic conductive film.
9. The magnetic memory device according to claim 1 , wherein
an anti-ferromagnetic layer is provided on an opposite side to the nonmagnetic middle layer of the second magnet layer.
10. The magnetic memory device according to claim 1 , wherein
the current including a resonance frequency component is a high frequency current including a resonance frequency component.