Nozzle members, compositions, and methods for micro-fluid ejection heads
An improved photoimaged nozzle plate for a micro-fluid ejection head, a micro-fluid ejection head containing the nozzle plate, and methods for making a micro-fluid ejection head. The improved nozzle plate is provided by a photoresist nozzle plate layer applied to a thick film layer on a semiconductor substrate containing fluid ejector actuators. The photoresist nozzle plate layer has a plurality of nozzle holes therein. Each of the nozzle holes are formed in the nozzle plate layer from an exit surface of the nozzle plate layer to an entrance surface of the nozzle plate layer. Each of the nozzle holes has a reentrant hole profile with a wall angle greater than about 4° up to about 30° measured from an axis orthogonal to a plane defined by the exit surface of the nozzle plate layer.
1. A photoimaged nozzle member for a micro-fluid ejection head, the nozzle member comprising:
a photoresist nozzle layer attached to a thick film layer on a substrate having fluid ejector actuators, the photoresist nozzle layer derived from a composition comprising a first di-functional epoxy compound, a second di-functional epoxy compound, a polyhydroxy ether compound, a photoacid generator, and a solvent and having a plurality of nozzles therein, wherein the nozzles are formed in the nozzle layer from an exit surface of the nozzle layer to an entrance surface of the nozzle layer so that an exit diameter of the nozzles is smaller than an entrance diameter of the nozzles.
2. The nozzle member of claim 1 , wherein the nozzles are aligned to the fluid ejector actuators.
3. The nozzle member of claim 1 , wherein the nozzle layer has a thickness ranging from about 10 to about 20 microns.
4. The nozzle member of claim 1 , wherein the composition is further comprised of an adhesion enhancing agent.
5. The nozzle member of claim 1 , wherein the solvent is comprised of an aliphatic ketone solvent and acetone.
6. The nozzle member of claim 1 , wherein the composition is comprised of from about 0.5 to about 5.0 percent by weight of the photoacid generator based on a total weight of the composition.