IP Library Granted Patent US 7,981,323
Granted Patent B2
US 7,981,323 · App. 11/777,386 · Granted Jul 19, 2011

Selenium containing electrically conductive copolymers

Assignee: Konarka Technologies, Inc.
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Quick Facts
Patent No.
US 7,981,323
App. No.
11/777,386
Granted
Jul 19, 2011
Kind
B2
Abstract

Monomeric, oligomeric and polymeric electrically conductive compounds and methods of making the compounds having a repeating unit having formula P1, as follows: where X is S or Se, Y is S or Se, wherein one or both of X and Y is Se, R is a substituent group capable of bonding to the ring structure. R may include hydrogen or isotopes thereof, hydroxyl, alkyl, including C 1 to C 20 primary, secondary or tertiary alkyl groups, arylalkyl, alkenyl, perfluoroalkyl, perfluororaryl, aryl, alkoxy, cycloalkyl, cycloalkenyl, alkanoyl, alkylthio, aryloxy, alkylthioalkyl, alkynyl, alkylaryl, arylalkyl, amido, alkylsulfinyl, alkoxyalkyl, alkylsulfonyl, aryl, arylamino, diarylamino, alkylamino, dialkylamino, arylarylamino, arylthio, heteroaryl, arylsulfinyl, alkoxycarbonyl, arylsulfonyl, carboxyl, halogen, nitro, cyano, sulfonic acid, or alkyl or phenyl substituted with one or more sulfonic acid, phosphoric acid, carboxylic acid, halo, amino, nitro, hydroxyl, cyano or epoxy moieties. Electrical devices utilizing the electrically conductive polymers is also disclosed.

Claims (25)

1. A composition of matter comprising:

a semiconducting copolymer doped with a polymeric acid of sufficient strength to form colloids, the copolymer containing a repeating unit having formula:

wherein X is Se, Y is S, R is a substituent group, n and m are independently selected integers having a total n+m of greater than or equal to 2, and Mo includes thieno[3,4-b]thiophene, thieno[3,2-b]thiophene, substituted thieno[3,4-b]thiophenes, substituted thieno[3,2-b]thiophene, dithieno[3,4-b:3′,4′-d]thiophene, bithiophene, phenylene, substituted phenylenes, naphthalene, substituted naphthalenes, biphenyl, terphenyl, or substituted terphenyl; and

a solvent or water.

2. The composition of claim 1 , wherein the compositions is an aqueous dispersion.

3. The composition of claim 1 , wherein the composition is a solution.

4. The composition of claim 1 , wherein the composition comprises an organic solvent and water.

5. The composition of claim 1 , wherein the polymeric acid is poly(styrene sulfonic acid).

6. The composition of claim 1 , wherein the polymeric acid is fluorinated sulfonic acid polymer.

7. The composition of claim 1 , wherein R is selected from the group consisting of hydrogen, isotopes of hydrogen, hydroxyl, alkyl, arylalkyl, alkenyl, perfluoroalkyl, perfluororaryl, aryl, alkoxy, cycloalkyl, cycloalkenyl, alkanoyl, alkylthio, aryloxy, alkylthioalkyl, alkynyl, alkylaryl, arylalkyl, amido, alkylsulfinyl, alkoxyalkyl, alkylsulfonyl, aryl, arylamino, diarylamino, alkylamino, dialkylamino, arylarylamino, arylthio, heteroaryl, arylsulfinyl, alkoxycarbonyl, arylsulfonyl, carboxyl, halogen, nitro, cyano, sulfonic acid, and alkyl and phenyl substituted with one or more sulfonic acid, sulfonic acid derivative, phosphoric acid, phosphoric acid derivative, carboxylic acid, carboxylic acid derivative, halo, amino, nitro, hydroxyl, cyano, and epoxy moieties.

8. The composition of claim 7 wherein R is H.

9. The composition of claim 1 , wherein Mo is selected from the group consisting of selenolo[3,4-b]thiophenes, selenolo[2,3-c]thiophenes and selenolo[2,3-c]selenophenes.

10. The composition of claim 1 , wherein Mo is selected from the group consisting of the following the compound formulas:

wherein X denotes S, O, Se, or NH; and

wherein R 1 and R 2 are independently selected from the group consisting of H, C1-C4 alkyl groups, 1,2 cyclohexylene radical, phenyl substituted phenyl and combinations thereof.

11. The composition of claim 1 , wherein the composition includes an additive selected from the group consisting of particulate copper, silver, nickel, aluminum, carbon black, talc, mica, wollastonite, silica, clay, TiO 2 , dyes, pigments, and combinations thereof.

12. A composition, comprising:

a semiconducting copolymer doped with a polymeric acid of sufficient strength to form colloids, the copolymer comprising the following repeating unit:

wherein X is Se, Y is S, R is a substituent group, each of a and b, independently, is 1, 2, or 3, each of d and e, independently, is 0, 1, 2, or 3, A, B, D, and E are independently selected from the group consisting of —CZ 1 ═CZ 2 —, —C≡C—, arylene, heteroarylene, substituted —CZ 1 ═CZ 2 —, substituted —C≡C—, substituted arylene, and substituted heteroarylene, the substituted —CZ 1 ═CZ 2 —, substituted —C≡C—, substituted arylene, and substituted heteroarylene, independently being substituted with R, and the Z 1 and Z 2 being independently selected from the group consisting of H, F, Cl and CN.

13. A composition, comprising:

a semiconducting copolymer doped with a polymeric acid of sufficient strength to form colloids, the copolymer comprising a repeating unit selected from the group consisting of:

wherein R is selected from the group consisting of hydrogen, isotopes of hydrogen, hydroxyl, alkyl, arylalkyl, alkenyl, perfluoroalkyl, perfluororaryl, aryl, alkoxy, cycloalkyl, cycloalkenyl, alkanoyl, alkylthio, aryloxy, alkylthioalkyl, alkynyl, alkylaryl, arylalkyl, amido, alkylsulfinyl, alkoxyalkyl, alkylsulfonyl, aryl, arylamino, diarylamino, alkyl amino, dialkylamino, arylarylamino, arylthio, heteroaryl, arylsulfinyl, alkoxycarbonyl, aryl sulfonyl, carboxyl, halogen, nitro, cyano, sulfonic acid, and alkyl and phenyl substituted with one or more sulfonic acid, sulfonic acid derivative, phosphoric acid, phosphoric acid derivative, carboxylic acid, carboxylic acid derivative, halo, amino, nitro, hydroxyl, cyano, and epoxy moieties, wherein R′ and R″ are independently of each other H, aryl or alkyl with 1 to 12 C-atoms.

14. A composition, comprising:

a semiconducting copolymer doped with a polymeric acid of sufficient strength to form colloids, the copolymer comprising the following repeat unit:

wherein X is Se and Y is S.

Assignments (7)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 29, 2013
From: KONARKA TECHNOLOGIES, INC.
To: MERCK KGAA
Reel/Frame 029717/0048 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 29, 2013
From: MERCK KGAA
To: MERCK PATENT GMBH
Reel/Frame 029717/0065 →
SECURITY AGREEMENT Recorded Oct 26, 2011
From: KONARKA TECHNOLOGIES, INC.
To: TOTAL GAS & POWER USA (SAS)
Reel/Frame 027465/0192 →
AMENDMENT TO SECURITY AGREEMENT Recorded Oct 17, 2011
From: KONARKA TECHNOLOGIES, INC.
To: MASSACHUSETTS DEVELOPMENT FINANCE AGENCY
Reel/Frame 027468/0697 →
SECURITY AGREEMENT Recorded Oct 17, 2011
From: KONARKA TECHNOLOGIES, INC.
To: MASSACHUSETTS DEVELOPMENT FINANCE AGENCY
Reel/Frame 027297/0772 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 5, 2010
From: AIR PRODUCTS AND CHEMICALS, INC.
To: KONARKA TECHNOLOGIES, INC.
Reel/Frame 025325/0966 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 31, 2007
From: ZAHN, STEFFEN
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 019624/0260 →
Continuity (1)
Related Publication 20090014693A1 · Jan 15, 2009