Multi-layer nonvolatile memory devices having vertical charge storage regions

1. A nonvolatile memory device comprising:

a plurality of intergate insulating patterns and a plurality of cell gate patterns that are alternately and vertically stacked on a substrate;

an active pattern disposed on the substrate, the active pattern extending upwardly along sidewalls of the intergate insulating patterns and the cell gate patterns;

a plurality of charge storage patterns disposed between the plurality of cell gate patterns and the active pattern, respectively, the plurality of the charge storage patterns being separated from each other;

tunnel insulating patterns disposed between the plurality of cell gate patterns and the active pattern, respectively, and the tunnel insulating patterns extending to be directly connected to each other; and

a plurality of blocking insulating patterns disposed between the plurality of cell gate patterns and the plurality of charge storage patterns, respectively.

2. The nonvolatile memory device of claim 1 , wherein a sidewall of the cell gate pattern is recessed laterally so that an undercut region is defined and the charge storage pattern is disposed in the undercut region.

3. The nonvolatile memory device of claim 2 , wherein the tunnel insulating pattern is disposed in the undercut region, and

wherein the extended portion of the tunnel insulating pattern is disposed between a sidewall of the intergate insulating pattern and the active pattern.

4. The nonvolatile memory device of claim 2 , wherein the active pattern comprises a protrusion extending in the undercut region.

5. The nonvolatile memory device of claim 2 , wherein the blocking insulating patterns are separated from each other.

6. The nonvolatile memory device of claim 1 , further comprising:

a first select gate pattern disposed between the substrate and a lowermost cell gate pattern among the cell gate patterns;

a first gate insulating layer disposed between the first select gate pattern and the active pattern;

a second select gate pattern disposed on an uppermost cell gate pattern among the cell gate patterns and extending in a first direction;

a second gate insulating layer disposed between the second select gate pattern and the active pattern; and

a bit line disposed on a top surface of the second select gate pattern and extending a second direction perpendicular to the first direction.

7. The nonvolatile memory device of claim 6 , further comprising:

a well region disposed in the substrate and doped with dopants of a first conductivity type;

a common source region disposed in the well region and doped with dopants of a second conductivity type; and

a common drain region formed in an uppermost portion of the active pattern and doped with dopants of the second conductivity type, wherein the active pattern is in contact with the common source region and the bit line is electrically connected to the common drain region.

8. The nonvolatile memory device of claim 7 , wherein the active pattern is in contact with the well region.

9. The nonvolatile memory device of claim 1 , wherein the active pattern is disposed in a hole penetrating the cell gate patterns and the intergate insulating patterns, and sidewalls of the cell gate patterns and the intergate insulating patterns constitute a sidewall of the hole.

10. The nonvolatile memory device of claim 1 , wherein the intergate insulating patterns and the cell gate patterns have a line shape extending along a specific direction parallel to a top surface of the substrate.