RF power delivery diagnostic system
An RF power delivery diagnostic system is provided herein. The system comprises an RF power source ( 303 ), an impedance matching network ( 305 ), a plasma reactor ( 307 ) in electrical contact with the RF power source by way of the impedance matching network, a first RF sensor ( 309 ) adapted to measure at least one attribute of the RF power input to the impedance matching network, and a second RF sensor ( 311 ) adapted to measure at least one attribute of the RF power output by the impedance matching network.
1. A system, comprising:
an RF power source;
an impedance matching network;
a plasma reactor in electrical contact with said RF power source by way of said impedance matching network;
a first RF sensor adapted to measure at least one attribute of the RF power input to said impedance matching network, said first RF sensor adapted to measure the RF power P.sub.i at the input of said impedance matching network; and
a second RF sensor adapted to measure at least one attribute of the RF power output by said impedance matching network, said second RF sensor adapted to measure the RF power P.sub.o at the output of said impedance matching network; and
wherein a voltage detector is disposed within said second RF sensor, said voltage detector DC coupled to the voltage at the output of said impedance matching network.
2. A system, comprising:
an RF power source;
an impedance matching network;
a plasma reactor in electrical contact with said RF power source by way of said impedance matching network;
a first RF sensor adapted to measure at least one attribute of the RF power input to said impedance matching network, said first RF sensor adapted to measure the RF power P.sub.i at the input of said impedance matching network; and
a second RF sensor adapted to measure at least one attribute of the RF power output by said impedance matching network, said second RF sensor adapted to measure the RF power P.sub.o at the output of said impedance matching network; and
wherein a current detector is disposed within said second RF sensor, said current detector AC coupled to the output of said impedance matching network.
3. A system, comprising:
an RF power source;
an impedance matching network;
a plasma reactor in electrical contact with said RF power source by way of said impedance matching network;
a first RF sensor adapted to measure at least one attribute of the RF power input to said impedance matching network;
a second RF sensor adapted to measure at least one attribute of the RF power output by said impedance matching network; and
a chassis, said chassis containing said impedance matching network, said first and second RF sensors, and comprising:
a first portion of cable connecting said impedance matching network to said RF power source; and
a second portion of cable connecting said impedance matching network to said plasma reactor;
wherein said chassis is equipped with a first port that is in electrical communication with said first portion of said cable, and a second port that is in electrical communication with said second portion of said cable.
4. The system of claim 3 , wherein said first RF sensor is connected to said chassis by way of said first port, and wherein said second RF sensor is connected to said chassis by way of said second port.
5. The system of claim 3 , wherein said first RF sensor is equipped with a lead that is insertable into said first port, and wherein said second RF sensor is equipped with a lead that is insertable into said second port.