Semiconductor storage device

1. A semiconductor storage device comprising:

a semiconductor substrate;

a plurality of memory cell arrays laminated on the semiconductor substrate, each of the memory cell arrays including a plurality of first wirings and a plurality of second wirings formed to intersect with each other, and memory cells each arranged at respective intersections between the first wirings and the second wirings, each of the memory cells including a rectifier element and a variable resistance element connected in series; and

a control circuit operative to selectively drive the first and second wirings,

the first and second wirings being shared by two of the memory cell arrays located adjacent to each other in a lamination direction;

the control circuit being operative to provide, in a first memory cell array selected from among the plurality of the memory cell arrays, a first potential to a selected first wiring, a first standard potential that is lower than the first potential to a non-selected first wiring, a second potential that is lower than the first potential to a selected second wiring, and a second standard potential that is higher than the second potential to a non-selected second wiring,

the control circuit being operative to provide, in a non-selected second memory cell array that shares the first wiring with the first memory cell array as well as in a non-selected third memory cell array located more distant from the first memory cell array than the second memory cell array, the first potential to all of the first wirings and all of the second wirings, and

the control circuit being operative to provide, in a non-selected fourth memory cell array that shares the second wiring with the first memory cell array, as well as in a non-selected fifth memory cell array located more distant from the first memory cell array than the fourth memory cell array, the second potential to all of the first wirings and all of the second wirings.

2. The semiconductor storage device according to claim 1 , wherein the memory cell arrays are selected in an order that skips a single memory cell array sandwiched between a previously-selected memory cell array and another memory cell array to be selected next.

3. The semiconductor storage device according to claim 1 ,

wherein a reverse bias voltage is applied to a memory cell in the second and fourth memory cell arrays, while the reverse bias voltage is not applied to any memory cells in the third and fifth memory cell arrays.

4. The semiconductor storage device according to claim 1 , wherein the control circuit sets the first standard potential to a larger value than the second potential by a certain bias value, or sets the second standard potential to a smaller value than the first potential by a certain bias value.

5. The semiconductor storage device according to claim 4 ,

wherein the memory cell arrays are selected in an order that skips a single memory cell array sandwiched between a previously-selected memory cell array and another memory cell array to be selected next.

6. The semiconductor storage device according to claim 4 ,

wherein the variable resistance element changes from a high resistance state to a low resistance state caused by the first potential.

7. The semiconductor storage device according to claim 4 ,

wherein a reverse bias voltage is applied to a memory cell in the second and fourth memory cell arrays, while the reverse bias voltage is not applied to any memory cells in the third and fifth memory cell arrays.

8. The semiconductor storage device according to claim 4 ,

wherein the variable resistance element changes from a high resistance state to a low resistance state caused by the first potential.

9. The semiconductor storage device according to claim 1 , wherein the plurality of the memory cell arrays are formed so as to be laminated on a semiconductor substrate, and

the first wiring is connected to a memory cell in a memory cell array formed above the first wiring, as well as to a memory cell in another memory cell array formed below the first wiring.

10. The semiconductor storage device according to claim 1 , wherein the memory cell arrays are selected in an order that skips a single memory cell array sandwiched between a previously-selected memory cell array and another memory cell array to be selected next.

11. The semiconductor storage device according to claim 9 ,

wherein a reverse bias voltage is applied to a memory cell in the second and fourth memory cell arrays, while the reverse bias voltage is not applied to any memory cells in the third and fifth memory cell arrays.

12. The semiconductor storage device according to claim 9 ,

wherein the control circuit sets the first standard potential to a larger value than the second potential by a certain bias value, or sets the second standard potential to a smaller value than the first potential by a certain bias value.

13. The semiconductor storage device according to claim 12 ,

wherein the memory cell arrays are selected in an order that skips a single memory cell array sandwiched between a previously-selected memory cell array and another memory cell array to be selected next.

14. The semiconductor storage device according to claim 12 ,

wherein the variable resistance element changes from a high resistance state to a low resistance state caused by the first potential.

15. The semiconductor storage device according to claim 12 ,

wherein a reverse bias voltage is applied to a memory cell in the second and fourth memory cell arrays, while the reverse bias voltage is not applied to any memory cells in the third and fifth memory cell arrays.

16. The semiconductor storage device according to claim 12 ,

wherein the variable resistance element changes from a high resistance state to a low resistance state caused by the first potential.