Structured organic films
View Patent ↗A structured organic film comprising a plurality of segments and a plurality of linkers arranged as a covalent organic framework, wherein the structured organic film may be a multi-segment thick structured organic film.
1. A structured organic film (SOF) comprising a plurality of segments including at least a first segment type and a plurality of linkers including at least a first linker type arranged as a covalent organic framework (COF), wherein the SOF is a substantially defect-free film, and the first segment type and/or the first linker type comprises at least one atom that is not carbon.
2. The SOF of claim 1 , wherein the plurality of segments consists of segments having the first segment type comprising at least one atom that is not carbon, and the plurality of linkers consists of linkers of the first linker type.
3. The SOF of claim 1 , wherein the plurality of segments comprises at least the first segment type comprising at least one atom that is not carbon and a second segment type that is structurally different from the first segment type.
4. The SOF of claim 1 , wherein the plurality of linkers comprises at least the first linker type comprising at least one atom that is not carbon and a second linker type that is structurally different from the first linker type.
5. The SOF of claim 1 , wherein the plurality of segments have a core selected from the group consisting of carbon, nitrogen, silicon, or phosphorous atomic cores, alkoxy cores; aryl cores; carbonate cores; carbocyclic cores; carbobicyclic cores; carbotricyclic cores; and oligothiophene cores.
6. The SOF of claim 1 , wherein the plurality of linkers are selected from the group consisting of single atom linkers, single covalent bond linkers, double covalent bond linkers, ester linkers, ketone linkers, amide linkers, amine linkers, imine linkers, ether linkers, urethane linkers, and carbonates linkers.
7. The SOF of claim 1 , wherein the at least one atom of an element that is not carbon is selected from the group consisting of hydrogen, oxygen, nitrogen, silicon, phosphorous, selenium, fluorine, boron, and sulfur.
8. The SOF of claim 1 , wherein the SOF has less than 10 pinholes, pores or gaps greater than about 250 nanometers in diameter per cm 2 .
9. The SOF of claim 1 , wherein the SOF is a defect-free SOF.
10. The SOF of claim 1 , wherein the SOF is periodic.
11. A process for preparing a structured organic film (SOF) comprising:
(a) preparing a liquid-containing reaction mixture comprising a plurality of molecular building blocks each comprising a segment and a number of functional groups;
(b) depositing the reaction mixture as a wet film; and
(c) promoting change of the wet film to form a dry SOF.
12. The process of claim 11 , further comprising promoting a reaction of the functional groups, wherein no byproduct is formed as a result of the reaction of the functional groups.
13. The process of claim 11 , wherein the SOF is formed after the wet film is exposed to oven drying or infrared radiation (IR) or oven drying and IR drying.
14. The process of claim 11 , wherein the reaction mixture is deposited as a wet film on a substrate.
15. The process of claim 14 , further comprising removing the dry SOF from the substrate to obtain a free-standing SOF.
16. The process of claim 14 , wherein the substrate is a SOF substrate.
17. The process of claim 16 , further comprising chemically attaching the dry SOF to the SOF substrate by either covalent or ionic bonds.
18. The process of claim 11 , further comprising promoting a reaction of the functional groups, wherein a volatile byproduct is formed as a result of the reaction of the functional groups.
19. A process for preparing a structured organic film (SOF) comprising:
(a) preparing a liquid-containing reaction mixture comprising a plurality of molecular building blocks each comprising a segment and a number of functional groups;
(b) depositing the reaction mixture as a wet film on a substrate;
(c) promoting change of the wet film to form a dry SOF; and
(d) removing the dry SOF from the substrate to obtain a single free-standing SOF.
20. The SOF of claim 1 , wherein the SOF is a mono-segment thick layer with a thickness of from about 10 Angstroms to about 250 Angstroms; or the SOF is a multi-segment thick layer with a thickness of from about 20 nm to about 5 mm.
21. A structured organic film (SOF) comprising a plurality of segments including at least a first segment type and a plurality of linkers including at least a first linker type arranged as a covalent organic framework (COF), wherein the SOF is a substantially defect-free film, and the first segment type and/or the first linker type comprises a hydrogen.
22. The SOF of claim 21 , wherein the plurality of segments consists of segments having the first segment type comprising a hydrogen atom, and the plurality of linkers consists of linkers of the first linker type.
23. The SOF of claim 21 , wherein the plurality of segments comprises at least the first segment type comprising a hydrogen atom and a second segment type that is structurally different from the first segment type.
24. The SOF of claim 21 , wherein the plurality of linkers comprises at least the first linker type comprising a hydrogen and a second linker type that is structurally different from the first linker type.
25. The SOF of claim 21 , wherein the plurality of segments have a core selected from the group consisting of carbon, nitrogen, silicon, or phosphorous atomic cores, alkoxy cores, aryl cores, carbonate cores, carbocyclic cores, carbobicyclic cores, carbotricyclic cores, and oligothiophene cores; or the plurality of linkers are selected from the group consisting of single atom linkers, single covalent bond linkers, double covalent bond linkers, ester linkers, ketone linkers, amide linkers, amine linkers, imine linkers, ether linkers, urethane linkers, and carbonates linkers.
26. The SOF of claim 21 , wherein the plurality of segments and/or the plurality of linkers comprises at least one atom selected from the group consisting of oxygen, nitrogen, silicon, phosphorous, selenium, fluorine, boron, and sulfur.
27. The SOF of claim 21 , wherein the SOF has less than 10 pinholes, pores or gaps greater than about 250 nanometers in diameter per cm 2 .
28. The SOF of claim 21 , wherein the SOF is a defect-free SOF.
29. The SOF of claim 21 , wherein the SOF is periodic.
30. The SOF of claim 21 , wherein the SOF is a mono-segment thick layer with a thickness of from about 10 Angstroms to about 250 Angstroms; or the SOF is a multi-segment thick layer with a thickness of from about 20 nm to about 5 mm.