Graphene oxide deoxygenation
View Patent ↗A graphene oxide (GO) target is exposed to light having power sufficient to initiate a deoxygenation reaction of the GO target. The deoxygenation reaction of the GO target transforms the GO target to graphene.
1. A method, comprising the step of:
exposing a porous graphene oxide (GO) target to a light pulse having power and duration sufficient to initiate a deoxygenation reaction of the GO target, wherein the deoxygenation reaction of the GO target transforms the porous GO target to graphene and the porous GO target comprises sufficient surface area for propagation of the deoxygenation reaction.
2. The method of claim 1 , further comprising the step of preparing the porous GO target by drying a dispersion of graphene oxide to form a porous GO structure.
3. The method of claim 2 , wherein the step of drying comprises the step of:
freeze-drying the dispersion of graphene oxide to form the porous GO structure.
4. The method of claim 2 , further comprising the step of:
forming the dispersion of graphene oxide with a graphene oxide density approximately between 5 milligrams and 15 milligrams of graphene oxide per milliliter.
5. The method of claim 1 , wherein the deoxygenation reaction of the GO target is a photothermal decomposition of the GO target.
6. The method of claim 1 , further comprising the step of:
mixing the porous GO target with an oxygen-scavenging catalyst that scavenges oxygen during the deoxygenation reaction of the GO target.
7. The method of claim 6 , wherein the oxygen-scavenging catalyst comprises one or more of nickel, copper, silicon, or magnesium.
8. The method of claim 1 , further comprising the step of:
forming the porous GO target as a thin film.
9. The method of claim 8 , wherein the step of forming the porous GO target as a thin film comprises the step of:
forming the porous GO target as a thin film with a thickness approximately between 1 nanometer and 20 microns.
10. The method of claim 8 , wherein the step of exposing the porous GO target to light comprises the step of:
exposing the thin film to light to form the graphene in a desired pattern.
11. The method of claim 10 , wherein the step of exposing the thin film comprises the step of:
exposing the thin film to light from a photolithographic light source to form the graphene in the desired pattern.
12. The method of claim 11 , further comprising the step of:
forming the porous GO target as a thin film onto a catalytic metal substrate, wherein the catalytic metal substrate scavenges oxygen during the deoxygenation reaction of the GO target.
13. The method of claim 1 , wherein the step of exposing the porous GO target to light comprises the step of:
exposing the porous GO target to light with a wavelength between 200 nanometers and 400 nanometers.
14. The method of claim 1 wherein the duration of the light pulse is between 10 μs and 50 ms.