IP Library Granted Patent US 8,324,713
Granted Patent B2
US 8,324,713 · App. 12/715,103 · Granted Dec 4, 2012

Profile design for lateral-vertical bipolar junction transistor

Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
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Quick Facts
Patent No.
US 8,324,713
App. No.
12/715,103
Granted
Dec 4, 2012
Kind
B2
Abstract

A lateral-vertical bipolar junction transistor (LVBJT) includes a well region of a first conductivity type over a substrate; a first dielectric over the well region; and a first electrode over the first dielectric. A collector of a second conductivity type opposite the first conductivity type is in the well region and on a first side of the first electrode, and is adjacent the first electrode. An emitter of the second conductivity type is in the well region and on a second side of the first electrode, and is adjacent the first electrode, wherein the second side is opposite the first side. A collector extension region having a lower impurity concentration than the collector adjoins the collector and faces the emitter. The LVBJT does not have any emitter extension region facing the collector and adjoining the emitter.

Claims (38)

1. A lateral-vertical bipolar junction transistor (LVBJT) comprising:

a substrate;

a well region of a first conductivity type over the substrate;

a first dielectric over the well region;

a first electrode over the first dielectric;

a collector of a second conductivity type opposite the first conductivity type in the well region, wherein the collector is on a first side of the first electrode and adjacent the first electrode;

an emitter of the second conductivity type in the well region, wherein the emitter is on a second side of the first electrode and adjacent the first electrode, wherein the second side is opposite the first side;

a base contact of the first conductivity type in the well region and adjacent the collector, wherein the collector substantially encircles the base contact on more than one side of the base contact;

a gate strip over the well region, wherein the collector and the base contact are on opposite sides of the gate strip, and wherein the collector and the base contact both contact a same portion of the well region, with the same portion being directly under the gate strip; and

a collector extension region having a lower impurity concentration than the collector, wherein the collector extension region adjoins the collector, wherein the collector extension region faces the emitter, and wherein the LVBJT does not comprise any emitter extension region facing the base contact.

2. The LVBJT of claim 1 , wherein the emitter is not connected to any emitter extension region.

3. The LVBJT of claim 1 , wherein no pocket regions are formed in the well region and adjacent either of the collector and the emitter.

4. The LVBJT of claim 1 further comprising no collector extension region facing the base contact and adjoining the collector.

5. The LVBJT of claim 1 further comprising:

a second dielectric over the well, region and laterally between the base contact and the collector; and

a second electrode over the second dielectric, wherein the base contact and the collector have edges substantially aligned to respective edges of the second electrode.

6. The LVBJT of claim 5 , wherein the second electrode is floating.

7. The LVBJT of claim 1 , wherein no isolation region is laterally between the collector and the base contact and in the well region.

8. The LVBJT of claim 1 , wherein the first electrode is not floating.

9. The LVBJT of claim 1 further comprising:

a plurality of collectors of the second conductivity type in the well region and interconnected to each other, wherein the plurality of collectors comprises the collector, and wherein each side of the emitter is adjacent to and parallel with a side of a respective one of the plurality of collectors; and

a plurality of base contacts of the first conductivity type in the well region and interconnected to each other, wherein the emitter does not comprise any side adjacent to and parallel with any side of any one of the plurality of base contacts.

10. The LVBJT of claim 1 , wherein the collector extension region is shallower than the collector.

11. The LVBJT of claim 1 , wherein the collector extension region is deeper than the collector.

12. A lateral-vertical bipolar junction transistor (LVBJT) comprising:

a substrate;

a well region of a first conductivity type over the substrate;

at least one emitter of a second conductivity type opposite the first conductivity type in the well region and interconnected to each other;

a plurality of collectors of the second conductivity type in the well region, wherein the plurality of collectors is interconnected to each other;

a plurality of base contacts of the first conductivity type in the well region, wherein the plurality of base contacts is interconnected to each other, wherein the plurality of base and the plurality of collectors are separated from each other by the well region, wherein each of the at least one emitter is surrounded by more than one of the plurality of collectors, and wherein none of the base contacts comprise a side adjacent to and substantially parallel with any side of the at least one emitter; and

a plurality of collector extension regions of the second conductivity type in the well region and adjoining the plurality of collectors, wherein the plurality of collector extension regions faces the at least one emitter, and wherein the LVBJT comprises no emitter extension region adjoining the at least one emitter and facing the plurality of collectors.

13. The LVBJT of claim 12 further comprising no emitter extension region adjoining the emitter and in directions not facing the plurality of collectors.

14. The LVBJT of claim 12 , wherein no pocket regions are formed in the well region and adjacent the plurality of collectors and the at least one emitter.

15. The LVBJT of claim 12 further comprising:

a first plurality of gate strips over the well region, wherein each of the first plurality of gate strips is adjacent to and laterally between one of the at least one emitter and one of the plurality of collectors, and wherein the first plurality of gate strips is not floating; and

a second plurality of gate strips over the well region, wherein each of the second plurality of gate strips is adjacent to and laterally between one of the plurality of base contacts and one of the plurality of collectors, and wherein the second plurality of gate strips is floating.

16. The LVBJT of claim 13 , wherein the first conductivity type is n-type and the second conductivity type is p-type.

17. The LVBJT of claim 13 , wherein the first conductivity type is p-type and the second conductivity type is n-type.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 2, 2010
From: CHEN, SHUO-MAO; CHAO, CHIH-PING; CHANG, CHIH-SHENG; TSENG, HUA-CHOU
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 024015/0322 →
Continuity (4)
Continuation In Part 11589478 · Oct 30, 2006
Provisional Application 61187796 · Jun 17, 2009
Provisional Application 60731720 · Oct 31, 2005
Related Publication 20100213575A1 · Aug 26, 2010