Weak-link capacitor
View Patent ↗A process for making a dielectric material where a precursor polymer selected from poly(phenylene vinylene)polyacetylene, poly(p-phenylene), poly(thienylene vinylene), poly(1,4-naphthylene vinylene), and poly(p-pyridine vinylene) is energized said by exposure by radiation or increase in temperature to a level sufficient to eliminate said leaving groups contained within the precursor polymer, thereby transforming the dielectric material into a conductive polymer. The leaving group in the precursor polymer can be a chloride, a bromide, an iodide, a fluoride, an ester, an xanthate, a nitrile, an amine, a nitro group, a carbonate, a dithiocarbamate, a sulfonium group, an oxonium group, an iodonium group, a pyridinium group, an ammonium group, a borate group, a borane group, a sulphinyl group, or a sulfonyl group.
1. A process, comprising:
making a poly(phenylene vinylene) dielectric precursor polymer selected from C 20 H 16 Br 2 and C 20 H 16 I 2 , said precursor polymer comprising a halogen leaving group selected from a bromide and an iodide; and
energizing said dielectric precursor polymer by a method selected from exposure by radiation and increase in temperature to a level sufficient to eliminate said halogen leaving group, thereby transforming said dielectric precursor polymer into a semiconductive or conductive polymer.
2. The process of claim 1 , wherein the halogen leaving group determines the dose level from the exposure by radiation or the temperature level from the increase in temperature sufficient to convert the dielectric precursor polymer into said semiconductive or conductive polymer.