IP Library Granted Patent US 8,472,014
Granted Patent B2
US 8,472,014 · App. 13/511,460 · Granted Jun 25, 2013

Refractive index distribution measuring method and refractive index distribution measuring apparatus

Inventor: Tomohiro Sugimoto (Yoshikawa, JP)
Assignee: Canon Kabushiki Kaisha
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Quick Facts
Patent No.
US 8,472,014
App. No.
13/511,460
Granted
Jun 25, 2013
Kind
B2
Abstract

A method includes measuring a transmitted wavefront of a test object by introducing reference light into the test object arranged in a medium having a refractive index different from a refractive index of the test object, and calculating a refractive index distribution of the test object by using a measurement result of the transmitted wavefront. The measuring step measures a first transmitted wavefront for a first wavelength and a second transmitted wavefront for a second wavelength different from the first wavelength. The calculating step calculates the refractive index distribution of the test object by removing a shape component of the test object utilizing measurement results of the first and the second transmitted wavefront, and a transmitted wavefront of a reference object arranged in the medium for each of the first and second wavelengths. The reference object has the same shape as the test object and a specific refractive index distribution.

Claims (21)

1. A refractive index distribution measuring method comprising the steps of:

measuring a transmitted wavefront of a test object by introducing reference light into the test object that is arranged in a medium having a refractive index different from a refractive index of the test object; and

calculating a refractive index distribution of the test object by using a measurement result of the transmitted wavefront,

wherein the measuring step measures a first transmitted wavefront for a first wavelength and a second transmitted wavefront for a second wavelength different from the first wavelength, and

wherein the calculating step calculates the refractive index distribution of the test object by removing a shape component of the test object utilizing measurement results of the first and the second transmitted wavefront, and a transmitted wavefront of a reference object arranged in the medium for each of the first and second wavelengths, the reference object having the same shape as the test object and a specific refractive index distribution.

2. The refractive index distribution measuring method according to claim 1 , wherein the measuring step uses a shearing interferometer to measure the transmitted wavefront of the object.

3. The refractive index distribution measuring method according to claim 1 , wherein the measuring step uses a Hartmann sensor to measure the transmitted wavefront of the object.

4. A production method for an optical element comprising the steps of:

molding the optical element; and

evaluating a molded optical element by measuring refractive index distribution of the optical element with a refractive index distribution measuring method, wherein the refractive index distribution measuring method includes the steps of:

measuring a transmitted wavefront of a test object by introducing reference light into the test object that is arranged in a medium having a refractive index different from a refractive index of the test object; and

calculating a refractive index distribution of the test object by using a measurement result of the transmitted wavefront,

wherein the measuring step measures a first transmitted wavefront for a first wavelength and a second transmitted wavefront for a second wavelength different from the first wavelength, and

wherein the calculating step calculates the refractive index distribution of the test object by removing a shape component of the test object utilizing measurement results of the first and the second transmitted wavefront, and a transmitted wavefront of a reference object arranged in the medium for each of the first and second wavelengths, the reference object having the same shape as the test object and a specific refractive index distribution.

5. A refractive index distribution measuring apparatus comprising:

a light source configured to emit light having a first wavelength and light having a second wavelength;

a measuring unit configured to measure a transmitted wavefront of a test object arranged in a medium having refractive index different from that of the test object by using the light from the light source; and

an operation unit configured to calculate a refractive index distribution of the test object based on a first transmitted wavefront measured for the first wavelength and a second transmitted wavefront measured for the second wavelength,

wherein the operation unit calculates the refractive index distribution of the test object by removing a shape component of the test object utilizing measurement results of the first and second transmitted wavefronts, and a transmitted wavefront of a reference object arranged in the medium for each of the first and second wavelengths, the reference object having the same shape as that of the test object and a specific refractive index.

6. The refractive index distribution measuring apparatus according to claim 5 , wherein the measuring unit includes a shearing interferometer.

7. The refractive index distribution measuring apparatus according to claim 5 , wherein the measuring unit includes a Hartmann sensor.

Assignments (3)
DECLARATION TO CORRECT ERRONEOUS FILING Recorded May 20, 2013
From: THE BANK OF NOVA SCOTIA
To: CANON KABUSHIKI KAISHA
Reel/Frame 030452/0391 →
RELEASE OF PATENT SECURITY AGREEMENT Recorded Mar 18, 2013
From: THE BANK OF NOVA SCOTIA
To: ASHLAND LICENSING AND INTELLECTUAL PROPERTY LLC; AQUALON COMPANY; ISP INVESTMENTS INC.; HERCULES INCORPORATED
Reel/Frame 030025/0320 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 21, 2012
From: SUGIMOTO, TOMOHIRO
To: CANON KABUSHIKI KAISHA
Reel/Frame 028414/0483 →
Priority Claims (1)
JP 2010-119558 · May 25, 2010 · national
Continuity (1)
Related Publication 20120241989A1 · Sep 27, 2012