IP Library Granted Patent US 8,518,554
Granted Patent B2
US 8,518,554 · App. 12/307,301 · Granted Aug 27, 2013

Ceramic metal composite and semiconductor device using the same

Inventors: Takayuki Naba (Kanagawa-ken, JP); Michiyasu Komatsu (Kanagawa-ken, JP); Noritaka Nakayama (Kanagawa-ken, JP); Hiromasa Kato (Kanagawa-ken, JP)
Assignees: Kabushiki Kaisha Toshiba; Toshiba Materials Co., Ltd.
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Quick Facts
Patent No.
US 8,518,554
App. No.
12/307,301
Granted
Aug 27, 2013
Kind
B2
Abstract

A ceramic-metal composite includes a ceramic substrate, an active metal brazing alloy layer, and a metal plate bonded to the ceramic substrate through the active metal brazing alloy layer disposed therebetween. The active metal brazing alloy layer contains a transition metal that is at least one element selected from Group-8 elements specified in the periodic table. According to the above configuration, the following composite and device can be provided: the ceramic-metal composite that exhibits high bonding strength, heat cycle resistance, durability, and reliability even if the ceramic-metal composite is used in a power module and a semiconductor device including the ceramic-metal composite.

Claims (12)

1. A ceramic-metal composite comprising:

a ceramic substrate;

an active metal brazing alloy layer containing Ag; Cu; at least one active metal selected from a group consisting of Ti and Zr; and a transition metal that is one of cobalt or palladium; and

a metal plate comprising a copper plate bonded to the ceramic substrate through the active metal brazing alloy layer disposed therebetween,

wherein the content of cobalt or palladium contained in the active metal brazing alloy layer is 0.02% to 0.5% by mass, and

wherein the one of cobalt or palladium is dispersed in the copper plate.

2. The ceramic-metal composite according to claim 1 , wherein the active metal is only Ti.

3. The ceramic-metal composite according to claim 1 , wherein the active metal brazing alloy layer further contains at least one of Sn and In.

4. The ceramic-metal composite according to claim 1 , wherein the active metal brazing alloy layer further contains carbon.

5. A semiconductor device comprising the ceramic-metal composite according to any one of claims 2 to 4 as a ceramic circuit board.

6. The ceramic-metal composite according to claim 1 , wherein the ceramic substrate is silicon nitride substrate or aluminum nitride substrate.

7. The ceramic-metal composite according to claim 1 , wherein bonding strength of the copper plate is 10.2 kN/m or more and 17.2 kN/m or less.

Assignments (4)
NUNC PRO TUNC ASSIGNMENT Recorded Feb 19, 2026
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MATERIALS CO. LTD.
Reel/Frame 074940/0511 →
CHANGE OF NAME Recorded Feb 19, 2026
From: TOSHIBA MATERIALS CO. LTD.
To: NITERRA MATERIALS CO., LTD.
Reel/Frame 074941/0803 →
CHANGE OF ADDRESS Recorded Feb 19, 2026
From: KABUSHIKI KAISHA TOSHIBA
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 074941/0846 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 7, 2009
From: NABA, TAKAYUKI; KOMATSU, MICHIYASU; NAKAYAMA, NORITAKA; KATO, HIROMASA
To: KABUSHIKI KAISHA TOSHIBA; TOSHIBA MATERIALS CO., LTD.
Reel/Frame 022067/0310 →
Priority Claims (1)
JP 2006-184321 · Jul 4, 2006 · national
Continuity (1)
Related Publication 20090283309A1 · Nov 19, 2009