Method for manufacturing magnetic storage device and magnetic storage device
View Patent ↗Disclosed is a method for manufacturing a magnetic storage device comprising a TMR element, which comprises a step for forming an insulting film on an interlayer insulating film provided with a wiring layer, an opening formation step for forming an opening in the insulating film so that the wiring layer is exposed therefrom, a metal layer formation step for forming a metal layer on the insulating layer so that the opening is filled therewith, a CMP step for polishing and removing the metal layer on the insulating layer by a CMP method and forming the metal layer remaining in the opening into a lower electrode, and a step for forming a TMR element on the lower electrode. Also disclosed is a magnetic storage device comprising an interlayer insulating film provided with a wiring layer, an insulating film formed on the interlayer insulating film, an opening formed in the insulating film so that the wiring layer is exposed therefrom, a barrier metal layer provided so as to cover the inner surface of the opening, a lower electrode formed on the barrier metal so as to fill the opening, and a TMR element formed on the lower electrode.
1. A method for manufacturing a magnetic storage device having a TMR element, the method comprising the steps of:
forming an insulating film on an interlayer insulating film provided with a wiring layer;
forming an opening in the insulating film so that the wiring layer is exposed therefrom;
forming a metal layer on the insulating film so that the opening is filled therewith;
polishing and removing the metal layer on the insulating film by a CMP method so that the surface of the insulating film is exposed and forming the metal layer remaining in the opening into a lower electrode; and
forming a TMR element on the lower electrode,
wherein the forming an opening step comprises a step of:
after forming the first opening that reaches the surface of the wiring layer from the surface of the insulating film, forming a second opening that communicates with the first opening and has an opening area larger than that of the first opening, from the surface of the insulating film to the middle of the insulating film.
2. The method for manufacturing a magnetic storage device according to claim 1 , further comprising the step of:
forming a barrier metal layer so as to cover the inner face of the opening and the surface of the insulating film, between the opening step and the metal layer forming step.