IP Library Granted Patent US 8,664,421
Granted Patent B2
US 8,664,421 · App. 11/910,359 · Granted Mar 4, 2014

Surface modifier and its use

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Quick Facts
Patent No.
US 8,664,421
App. No.
11/910,359
Granted
Mar 4, 2014
Kind
B2
Abstract

A surface modifier comprising an organosilicone compound represented by General Formula (A) and/or General Formula (B): F—(CF 2 ) q —(OC 3 F 4 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″Si(X′) 3-a (R 1 ) a (A) and F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″(X′) 2-a (R 1 ) a SiO(F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o —(CH 2 ) p XX″(X′) 1-a (R 1 ) a SiO) z F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″(X′) 2-a (R 1 ) a Si(B) wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; X is oxygen or a bivalent organic spacer group: X″ is a bivalent organosilicone spacer group; X′ is hydrolysable group; and z is an integer from 0 to 10 when a is 0 or 1.

Claims (47)

1. A surface modifier comprising an organosilicone compound represented by General Formula (A):

F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″Si(X′) 3-a (R 1 ) a

wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; X is oxygen (—O—), an amide group (—C(═O)—NH—), or an ester group (—C(═O)—O—); X″ is a bivalent organosilicone spacer group comprising —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b O— or —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b R 3 —, where R 2 is independently a C 1-22 hydrocarbon group, R 3 is independently a C 1-22 linear or branched optionally substituted alkylene group, and b is an integer from 1 to 100; R 1 is a C 1-22 linear or branched hydrocarbon group; a is an integer from 0 to 2; and X′ is a hydrolysable group selected from an alkoxy or alkoxy substituted alkoxy group, an acyloxy group, an alkenyloxy group, an iminoxy group, a substituted amino group, an amido group, a substituted aminoxy group, or halogen.

2. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 1, X is O, and a is 0 or 1.

3. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 1, X is oxygen, X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b R 3 — where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is independently a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

4. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 1, X is oxygen, X′ is alkoxy, X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b R 3 — where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is independently a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

5. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is oxygen, X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b O— where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

6. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is oxygen, X′ is alkoxy, X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b O— where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

7. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is amide, and a is 0 or 1.

8. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is amide, X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b R 3 — where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

9. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is amide, X′ is alkoxy, X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b R 3 — where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

10. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is amide, X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b O— where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

11. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is amide, X′ is alkoxy, X″ is —R 3 Si(R 2 ) 2 (O(R 2 )Si) b O— where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

12. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is an ester group (—C(═O)—O—), and a is 0 or 1.

13. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is an ester group (—C(═O)—O—), X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b R 3 — where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

14. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is an ester group (—C(═O)—O—), X′ is alkoxy, X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b R 3 — where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

15. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is an ester group (—C(═O)—O—), X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b O— where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

16. The surface modifier according to claim 1 , wherein in General Formula (A), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, X is an ester group (—C(═O)—O—), X′ is alkoxy, X″ is —R 3 Si(R 2 ) 2 (O(R 2 ) 2 Si) b O— where R 2 is independently C 1 to C 22 hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, b is 1-100, and a is 0 or 1.

17. The surface modifier according to claim 1 , with the addition of a catalyst to promote surface modification wherein the proportion of compound represented by General Formula (A) and catalyst is not limited.

18. A method for producing an organosilicone compound represented by General Formula (A):

F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″Si(X′) 3-a (R 1 ) a

wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; X is oxygen (—O—), an amide group (—(═O)—NH—), or an ester group (—C(═O)—O—); X″ is a bivalent organosilicone spacer group comprising —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b O— or —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b R 3 —, where R 2 is independently a C 1-22 hydrocarbon group, R 3 is independently a C 1-22 linear or branched optionally substituted alkylene group, and b is an integer from 1 to 100; R 1 is a C 1-22 linear or branched hydrocarbon group; X′ is a hydrolysable group selected from an alkoxy or alkoxy substituted alkoxy group, an acyloxy group, an alkenyloxy group, an iminoxy group, a substituted amino group, an amido group, a substituted aminoxy group, or halogen, and a is 0,

the method using a hydrosilylation reaction between HMe 2 Si(OMe 2 Si) b R 3 Si(X′) 3-a (R 1 ) a where R 1 is a C 1-22 linear or branched hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, a is either 0 or 1, b is an integer from 1-100 and a compound represented by General Formula (C) below in the presence of a transition metal:

F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″′  (C)

wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; X is oxygen (—O—), an amide group (—C(═O)—NH—), or an ester group (—C(═O)—O—); and X″′ is a monovalent organic group having terminal ethylenic unsaturation.

19. A method for producing an organosilicone compound represented by General Formula (A):

F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″Si(X′) 3-a (R 1 ) a

wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; X is oxygen (—O—), an amide group (—C(═O)—NH—), or an ester group (—C(═O)—O—); X″ is a bivalent organosilicone spacer group comprising —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b O— or —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b R 3 —, where R 2 is independently a C 1-22 hydrocarbon group, R 3 is independently a C 1-22 linear or branched optionally substituted alkylene group, and b is an integer from 1 to 100, R 1 is a C 1-22 linear or branched hydrocarbon group; X′ is a hydrolysable group selected from an alkoxy or alkoxy substituted alkoxy group, an acyloxy group, an alkenyloxy group, an iminoxy group, a substituted amino group, an amido group, a substituted aminoxy group, or halogen, and a is 0,

the method using a hydrosilylation reaction between HMe 2 Si(OMe 2 Si) b OSi(X′) 3-a (R 1 ) a where R 1 is a C 1-22 linear or branched hydrocarbon group, a is either 0 or 1, b is an integer from 0-100 and a compound represented by General Formula (C) below in the presence of a transition metal:

F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″′  (C)

wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; X is oxygen (—O—), an amide group (—C(═O)—NH—), or an ester group (—C(═O)—O—); and X″′ is a monovalent organic group having terminal ethylenic unsaturation.

20. A method for producing an organosilicone compound represented by General Formula (A):

F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″Si(X′) 3-a (R 1 ) a

wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; X is oxygen (—O—), an amide group (—C(═O)—NH—), or an ester group (—C(═O)—O—); X″ is a bivalent organosilicone spacer group comprising —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b O— or —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b R 3 —, where R 2 is independently a C 1-22 hydrocarbon group, R 3 is independently a C 1-22 linear or branched optionally substituted alkylene group, and b is an integer from 1 to 100, R 1 is a C 1-22 linear or branched hydrocarbon group; X′ is an alkoxy group, and a is 0,

the method using a hydrosilylation reaction between HMe 2 Si(OMe 2 Si) b R 3 Si(X′) 3-a (R 1 ) a where R 1 is a C 1-22 linear or branched hydrocarbon group, R 3 is a C 1-22 linear or branched optionally substituted alkylene group, a is either 0 or 1, b is an integer from 1-100 and a compound represented by General Formula (C) below in the presence of a transition metal:

F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″′  (C)

wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; and X is oxygen (—O—), an amide group (—C(═O)—NH—), or an ester group (—C(═O)—O—); and X″′ is a monovalent organic group having terminal ethylenic unsaturation.

21. A method for producing an organosilicone compound represented by General Formula (A):

F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″Si(X′) 3-a (R 1 ) a

wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; X is oxygen (—O—), an amide group (—C(═O)—NH—), or an ester group (—C(═O)—O—); X″ is a bivalent organosilicone spacer group comprising —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b O— or —R 3 Si(R 2 ) 2 (OSi(R 2 ) 2 ) b R 3 —, where R 2 is independently a C 1-22 hydrocarbon group, R 3 is independently a C 1-22 linear or branched optionally substituted alkylene group, and b is an integer from 1 to 100, R 1 is a C 1-22 linear or branched hydrocarbon group; X′ is an alkoxy group, and a is 0,

the method using a hydrosilylation reaction between HMe 2 Si(OMe 2 Si) b OSi(X) 3-a (R 1 ) a where R 1 is a C 1-22 linear or branched hydrocarbon group, a is either 0 or 1, b is an integer from 0-100 and a compound represented by General Formula (C) below in the presence of a transition metal:

F—(CF 2 ) q —(OC 3 F 6 ) m —(OC 2 F 4 ) n —(OCF 2 ) o (CH 2 ) p XX″′  (C)

wherein q is an integer from 1 to 3; m, n, and o are independently integers from 0 to 200; p is 0, 1 or 2; and X is oxygen (—O—), an amide group (—C(═O)—NH—), or an ester group (—C(═O)—O—); and X″′ is a monovalent organic group having terminal ethylenic unsaturation.

22. The method for producing an organosilicone compound according to claim 18 , wherein the transition metal is platinum or rhodium.

23. The method for producing an organosilicone compound according to claim 18 , wherein in General Formula (C), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 1, and X is O.

24. The method for producing an organosilicone compound according to claim 18 , wherein in General Formula (C), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, and X is amide.

25. The method for producing an organosilicone compound according to claim 18 , wherein in General Formula (C), q is 3, m is an integer from 10 to 200, n is 1, o is 0, p is 0, and X is an ester group (—C(═O)—O—).

Assignments (1)
CHANGE OF NAME Recorded Mar 29, 2018
From: DOW CORNING CORPORATION
To: DOW SILICONES CORPORATION
Reel/Frame 045381/0992 →