DLC film-forming method and DLC film
The present invention provides a DLC film that has good adhesiveness even in a low-temperature environment, and a DLC film-forming method capable of forming this DLC film. The present invention also provides a DLC film that has excellent initial compatibility, and a DLC film-forming method capable of forming this DLC film. In the present invention, a first opposing surface ( 31 ) that faces an inner clutch plate, of a substrate ( 30 ) of an outer clutch plate ( 15 ) is covered by a DLC film ( 26 ). Also, a treatment layer ( 33 ) is formed on a surface layer portion of the substrate ( 30 ). The treatment layer ( 33 ) is formed by applying direct-current pulse voltage to the substrate ( 30 ), and generating plasma in an atmosphere that contains argon gas and hydrogen gas.
1. A method for forming, inside a treatment chamber, a DLC film that covers at least a portion of a surface of a substrate, the DLC film-forming method comprising:
a pretreatment process that is executed in a reduced pressure state of a predetermined treatment pressure generated by a low-vacuum pump, and that supplies Ar ions and H ions to the surface of the substrate by applying direct-current pulse voltage to the substrate, and generating plasma in an atmosphere that contains argon gas and hydrogen-based gas inside the treatment chamber; and
a DLC deposition process that is executed after the pretreatment process in the reduced pressure state, and that forms a deposition layer of DLC on the surface of the substrate after the pretreatment process is executed, by applying direct-current pulse voltage to the substrate, and generating plasma in an atmosphere inside the treatment chamber, wherein:
in the pretreatment process and the DLC deposition process, a treatment time of both of the processes, the predetermined treatment pressure in both of the processes, or a frequency, duty ratio, or voltage value of the direct-current pulse voltage applied to the substrate in both of the processes, is set such that a temperature of the substrate becomes equal to or less than 300° C.;
the atmosphere inside the treatment chamber in the pretreatment process contains carbon-based gas and nitrogen-based gas; and
the pretreatment process includes a first process in which the argon gas and the hydrogen-based gas contained in the atmosphere are at higher concentrations than the carbon-based gas and the nitrogen-based gas, and a second process that is executed following the first process, and in which the carbon-based gas and the nitrogen-based gas contained in the atmosphere are at higher concentrations than the argon gas and the hydrogen-based gas.
2. The DLC film-forming method according to claim 1 , wherein the predetermined treatment pressure is set to equal to or less than 200 Pa in the DLC deposition process.
3. The DLC film-forming method according to claim 1 , wherein the frequency of the direct-current pulse voltage applied to the substrate is equal to or greater than 1000 Hz in the DLC deposition process.