IP Library Granted Patent US 8,906,804
Granted Patent B2
US 8,906,804 · App. 13/925,572 · Granted Dec 9, 2014

Composition including material, methods of depositing material, articles including same and systems for depositing materials

Inventors: Seth Coe-Sullivan (Redondo Beach, CA); Maria J. Anc (Groveland, MA); LeeAnn Kim (Dover, MA); John E. Ritter (Westford, MA); Marshall Cox (North Haven, CT); Craig Breen (Somerville, MA); Vladimir Bulovic (Lexington, MA); Ioannis Kymissis (New York, NY); Robert F. Praino, Jr. (Westwood, MA)
Assignee: QD Vision, Inc.
H01L21/02521B05D2401/32H01L21/02639B82Y30/00H01L21/02601H01L51/5012H01L21/02603B82Y40/00H01L21/02628H01L51/56B82Y20/00C01B31/0206
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Quick Facts
Patent No.
US 8,906,804
App. No.
13/925,572
Granted
Dec 9, 2014
Kind
B2
Abstract

Methods for depositing nanomaterial onto a substrate are disclosed. Also disclosed are compositions useful for depositing nanomaterial, methods of making devices including nanomaterials, and a system and devices useful for depositing nanomaterials.

Claims (33)

1. A method for depositing nanomaterial onto a substrate, the method comprising:

applying a patterned arrangement including a composition comprising nanomaterial comprising a plurality of semiconductor nanocrystals to an applicator surface from a transfer surface comprising contacting the surface of the applicator and the patterned arrangement disposed on a surface of the transfer surface; and

contacting the applicator surface to the substrate.

2. A method in accordance with claim 1 wherein the composition further includes liquid.

3. A method in accordance with claim 2 wherein the composition is introduced to the transfer surface by an inkcup.

4. A method in accordance with claim 1 wherein the transfer surface includes one or more grooves.

5. A method in accordance with claim 1 wherein the transfer surface is smooth.

6. A method in accordance with claim 1 wherein the transfer surface is surface treated.

7. A method in accordance with claim 4 wherein the transfer surface is surface treated.

8. A method in accordance with claim 7 wherein the surface treatment within the one or more grooves is different from the surface treatment outside of the one or more grooves.

9. A method in accordance with claim 4 wherein the grooves are arranged to form a predetermined pattern comprising nanomaterial on the substrate.

10. A method in accordance with claim 2 wherein the composition comprising nanomaterial is substantially free of liquid when applied to the applicator surface.

11. A method in accordance with claim 1 wherein the composition comprising nanomaterial is substantially free of liquid when deposited onto the substrate.

12. A method in accordance with claim 1 wherein two or more compositions are applied to the applicator surface, each composition comprising nanomaterial comprising a plurality of semiconductor nanocrystals.

13. A method in accordance with claim 1 wherein the nanomaterial comprises two or more different nanomaterials, wherein each nanomaterial comprises a plurality of semiconductor nanocrystals.

14. A method in accordance with claim 1 wherein the semiconductor nanocrystals comprise a core/shell structure.

15. A method in accordance with claim 14 wherein the core comprises a Group Iv element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof, and/or mixtures thereof.

16. A method in accordance with claim 15 wherein the shell comprises a Group IV element, a Group II-VI compound, a Group II-V compound, a Group III-VI compound, a Group III-V compound, a Group IV-VI compound, a Group compound, a Group II-IV-VI compound, a Group II-IV-V compound, alloys thereof, and/or mixtures thereof.

17. A method in accordance with claim 16 wherein the semiconductor nanocrystals include at least one ligand attached to the surface.

18. A method of depositing at least two nanomaterials onto a substrate comprising:

depositing a first patterned arrangement including a first composition comprising a first nanomaterial comprising a first plurality of semiconductor nanocrystals on a surface of a first applicator from a first transfer surface comprising contacting the surface of the first applicator and the first patterned arrangement disposed on a surface of the first transfer surface;

depositing a second patterned arrangement including a second composition comprising a second nanomaterial comprising a second plurality of semiconductor nanocrystals on the surface of a second applicator from a second transfer surface comprising contacting the surface of the second applicator and the second patterned arrangement disposed on a surface of the second transfer surface; and

contacting the surfaces of the first and second applicators to the substrate.

19. A method in accordance with claim 18 wherein each of the first and second nanomaterials is aligned on its respective applicator relative to a predetermined pattern to be formed on the substrate by the at least two nanomaterials.

20. A method of depositing at least two nanomaterials onto a substrate comprising:

depositing a first patterned arrangement including a first composition comprising a first nanomaterial comprising a first plurality of semiconductor nanocrystals on a surface of an applicator from a first transfer surface comprising contacting the surface of the applicator and the first patterned arrangement disposed on a surface of the first transfer surface;

depositing a second patterned arrangement including a second composition comprising a second nanomaterial comprising a second plurality of semiconductor nanocrystals on the surface of the applicator from a second transfer surface comprising contacting the surface of the applicator and the second patterned arrangement disposed on a surface of the second transfer surface; and

contacting the surface of the applicator with the substrate.

21. A method in accordance with claim 20 wherein each nanomaterial deposited to the surface of the applicator is aligned relative to the other to form a predetermined pattern comprising the at least two nanomaterials when deposited on the substrate.

22. A method in accordance with claim 18 wherein the first and second compositions are substantially free of liquid before contacting the substrate.

23. A method in accordance with claim 20 wherein the first and second compositions are substantially free of liquid before contacting the substrate.

24. A method in accordance with claim 1 wherein the transfer surface is a cliché.

25. A method in accordance with claim 1 wherein the transfer surface is silanized.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2016
From: QD VISION, INC.
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 041221/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 30, 2016
From: CAPRICORN-LIBRA INVESTMENT GROUP, LP
To: QD VISION, INC.
Reel/Frame 040766/0928 →
SECURITY INTEREST Recorded Aug 5, 2016
From: QD VISION, INC.
To: CAPRICORN-LIBRA INVESTMENT GROUP, LP
Reel/Frame 039595/0098 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 4, 2014
From: COE-SULLIVAN, SETH A.; ANC, MARIA J.; KIM, LEEANN; RITTER, JOHN E.; COX, MARSHALL; BREEN, CRAIG; BULOVIC, VLADIMIR; KYMISSIS, IOANNIS; PRAINO, ROBERT F., JR.; KAZLAS, PETER T.
To: QD VISION, INC.
Reel/Frame 032343/0012 →
Continuity (6)
Continuation 12287143 · Oct 6, 2008
Continuation PCTUS2007008873 · Apr 9, 2007
Provisional Application 60790393 · Apr 7, 2006
Provisional Application 60792170 · Apr 14, 2006
Provisional Application 60792086 · Apr 14, 2006
Related Publication 20140004686A1 · Jan 2, 2014