Chip comprising an integrated circuit, fabrication method and method for locally rendering a carbonic layer conductive
A method can be used for locally rendering a carbonic isolating layer conductive. In one embodiment, a laser beam is directed onto the carbonic isolating layer so as to convert amorphous carbon of the carbonic isolating layer into graphite-like carbon. In another embodiment, the carbonic layer is heated so as to form a conducting portion of the layer so that a lateral path through the conducting portion connects two circuit elements of the integrated circuit.
1. A method for locally rendering a carbonic isolating layer conductive, the method comprising:
directing a laser beam onto the carbonic isolating layer so as to convert amorphous carbon of the carbonic isolating layer into graphite-like carbon.
2. The method of claim 1 , wherein directing the laser beam comprises forming a lateral conducting path within the graphite-like carbon portion such that an isolating portion that comprises amorphous carbon surrounds and abuts the graphite-like carbon.
3. The method of claim 1 , wherein directing the laser beam onto the carbonic isolating layer is performed so that the laser beam travels through a further layer before impinging onto the carbonic isolating layer.