Anodically bonded strain isolator
A stress isolator that allows a sensor to be attached to materials of the same coefficient of thermal expansion and still provide the required elastic isolation between the sensor and the system to which it is mounted. The isolator is made of two materials, borosilicate glass and silicon. The glass is the same material as the mounting surface of the microelectromechanical system (MEMS) sensors. The silicon makes an excellent isolator, being very elastic and easy to form into complex shapes. The two materials of the isolator are joined using an anodic bond. The construction of the isolator can be specific to different types of MEMS sensors, making the most of their geometry to reduce overall volume.
1. An isolation apparatus comprising:
a first layer configured to bond to a mounting surface of a microelectromechanical system (MEMS) die, the first layer having a first coefficient of thermal expansion approximately equal to a second coefficient of thermal expansion of the mounting surface of the MEMS die; and
a spring layer formed of a monolithic material, the spring layer comprising:
a first section configured to bond to the first layer;
a second section configured to bond to a circuit board; and
one or more spring elements configured to flexibly attach the first section to the second section,
wherein the spring layer comprises silicon and the first layer comprises glass, wherein a bond between the first layer and the spring layer comprises an anodic bond.
2. An assembly comprising:
the isolation apparatus of claim 1 ; and the MEMS die, wherein the mounting surface of the MEMS die comprises glass.
3. The assembly of claim 2 , further comprising:
at least one metal pad bonded to the first layer;
at least one metal pad bonded to the MEMS die; and
at least one electrically conductive bonding material configured to provide a bond between the at least one first layer metal pad and the at least one MEMS die metal pad.
4. The apparatus of claim 3 , wherein the at least one MEMS die metal pad is electrically coupled to internal components of the MEMS die.
5. The apparatus of claim 1 , wherein the first layer comprises a cavity configured to allow the MEMS die to pass through when the MEMS die is mounted to the first layer.
6. The apparatus of claim 5 , wherein the first layer comprises at least one flange configured to bond to only the MEMS die.
7. The apparatus of claim 5 , wherein at least one of the first layer or the spring layer comprises a recess configured to provide separation of the at least one flange from the spring layer.
8. A method comprising:
anodically bonding a first layer to a first section of a spring layer formed of a monolithic material, the spring layer comprising silicon and the first layer comprising glass;
bonding the first layer to a mounting surface of a MEMS die, the first layer having a first coefficient of thermal expansion approximately equal to a second coefficient of thermal expansion of the mounting surface of the MEMS die; and
bonding a second section of the spring layer to a circuit board, wherein the spring layer comprises one or more spring elements that flexibly attach the first section to the second section.
9. The method of claim 8 , wherein the first layer and the mounting surface of the MEMS die comprise glass.
10. The method of claim 9 , wherein bonding the first layer to the mounting surface of the MEMS die comprises:
bonding at least one metal pad to the first layer;
bonding at least one metal pad to the MEMS die; and
bonding at least one electrically conductive bonding material between the at least one first layer metal pad and the at least one MEMS die metal pad.
11. The method of claim 10 , wherein the at least one MEMS die metal pad is electrically coupled to internal components of the MEMS die.
12. The method of claim 8 , further comprising etching a cavity into the first layer to allow the MEMS die to pass through when the MEMS die is mounted to the first layer.
13. The method of claim 12 , further comprising etching a recess into at least one of the first layer or the spring layer to provide separation of the at least one flange from the spring layer.
14. A microelectromechanical system (MEMS) package comprising:
a MEMS die comprising:
a sensor; and
a mounting surface; and
an isolation apparatus comprising:
a first layer configured to bond to the mounting surface of the MEMS die, the first layer having a first coefficient of thermal expansion approximately equal to a second coefficient of thermal expansion of the mounting surface of the MEMS die; and
a spring layer formed of a monolithic material, the spring layer comprising:
a first section configured to bond to the first layer;
a second section configured to bond to a circuit board; and
one or more spring elements configured to flexibly attach the first section to the second section,
wherein the spring layer comprises silicon and the first layer comprises glass, wherein a bond between the first layer and the spring layer comprises an anodic bond.
15. The package of claim 14 , wherein the first layer and the mounting surface of the MEMS die comprise glass.
16. The package of claim 15 , wherein the isolation apparatus further comprises:
at least one metal pad bonded to the first layer;
at least one metal pad bonded to the MEMS die; and
at least one electrically conductive bonding material bonded between the at least one first layer metal pad and the at least one MEMS die metal pad.
17. The package of claim 16 , wherein the at least one MEMS die metal pad is electrically coupled to internal components of the MEMS die.
18. The package of claim 14 , wherein the first layer comprises a cavity configured to allow the MEMS die to pass through when the MEMS die is mounted to the first layer, wherein the first layer comprises at least one flange configured to bond to only the MEMS die, wherein at least one of the first layer or the spring layer comprises a recess configured to provide separation of the at least one flange from the spring layer.