Semiconductor device with low-k gate cap and self-aligned contact
A semiconductor device includes at least a gate formed upon a semiconductor substrate, a contact trench self aligned to the gate, and a multilayered gate caps comprising a first gate cap formed upon each gate and a low-k gate cap formed upon the first gate cap. The multilayered gate cap may electrically isolate the gate from a self aligned contact formed by filling the contact trench with electrically conductive material. The multilayered gate cap reduces parasitic capacitance formed between the source-drain region, gate, and multilayered gate cap that may adversely impact device performance and device power consumption.
1. A semiconductor device fabrication process comprising:
forming at least one gate upon a semiconductor substrate;
forming a first gate cap upon the gate;
forming a first interlayer dielectric layer upon the semiconductor substrate so that an upper surface of the first interlayer dielectric layer is coplanar with an upper surface of the first gate cap;
forming a sacrificial gate cap upon the first gate cap;
forming a second interlayer dielectric layer upon the first interlayer dielectric layer surrounding the sacrificial gate cap;
forming a contact trench self aligned to the gate;
forming a self-aligned contact by filling the contact trench with electrically conductive material, and;
subsequent to forming the self aligned contact trench and prior to forming the self-aligned contact, forming a low-k gate cap upon the first gate cap, wherein the low-k gate cap is formed from a low-k material comprising a dielectric constant less than seven.
2. The semiconductor device fabrication process of claim 1 , further comprising:
subsequent to forming the self aligned contact trench and prior to forming the self-aligned contact, forming a cavity within the contact trench by removing the sacrificial gate cap.
3. The semiconductor device fabrication process of claim 2 , further comprising:
prior to forming the self-aligned contact, forming the low-k material upon sidewalls of the contact trench and within the cavity.
4. The semiconductor device fabrication process of claim 3 , further comprising:
removing the low-k material generally formed outside of the cavity.
5. The semiconductor device fabrication process of claim 4 , wherein the first gate cap and the low-k gate cap form a multilayered gate cap that electrically isolates the gate from the self-aligned contact.