Imaging device and imaging system

1. An imaging device comprising:

a light-sensing pixel region;

a first pixel region;

a second pixel region;

a first wiring layer disposed above the light-sensing pixel region;

a second wiring layer disposed above the topmost wiring layer of the wiring layer disposed above the light-sensing pixel region, above the second pixel region; and

a passivation film disposed extending from the light-sensing pixel region to the first pixel region and the second pixel region, of which a position of a top face located above the second wiring layer differs from a position of a top face located above the first wiring layer,

wherein the first pixel region is disposed between the light-sensing pixel region and the second pixel region, adjacent to the light-sensing pixel region and the second pixel region,

wherein the first pixel region overlaps, in plan view, a first shielding portion included in the first wiring layer,

wherein the second pixel region overlaps, in plan view, a second shielding portion included in the second wiring layer,

and wherein an electroconductive pattern is formed at the first wiring layer at a position overlapping the second pixel region in plan view.

2. The imaging device according to claim 1 ,

wherein the first shielding portion and the second shielding portion partially overlap each other in plan view.

3. The imaging device according to claim 1 ,

wherein a plurality of wiring layers are disposed above the light-sensing pixel region,

and wherein the first wiring layer is located at the topmost position of the plurality of wiring layers.

4. The imaging device according to claim 1 ,

wherein the first wiring layer and second wiring layer are adjacent to each other in a direction perpendicular to a light receiving surface of the light-sensing pixel region.

5. The imaging device according to claim 4 ,

wherein a through-hole is formed between the first wiring layer and the second wiring layer in at least a part of a region where the first shielding layer and the second shielding layer overlap in plan view.

6. The imaging device according to claim 5 ,

wherein the first shielding portion and the second shielding portion are electrically connected by a plug filled in the through-hole.

7. The imaging device according to claim 1 ,

wherein the first wiring layer has a predetermined pattern in a region located above the light-sensing pixel region, and also has the predetermined pattern in at least part of a region overlapping the second pixel region in plan view.

8. The imaging device according to claim 7 ,

wherein the predetermined pattern which the first wiring layer has is a pattern for regulating an opening for incident light as to the light-sensing pixel region, the first wiring layer having a shape the same as the predetermined pattern in a region overlapping the second pixel region in plan view.

9. The imaging device according to claim 1 ,

wherein the second wiring layer is not disposed in a region overlapping the first pixel region in plan view.

10. The imaging device according to claim 1 ,

wherein the first pixel region and the second pixel region include an optical black pixel.

11. The imaging device according to claim 1 ,

wherein an interlayer insulating film is disposed above the first wiring layer,

and wherein the interlayer insulating film has been polished by chemical mechanical polishing.

12. An imaging system comprising:

the imaging device according to claim 1 ;

an optical system configured to form an image at the light-sensing pixel region of the imaging device; and

a signal processing unit configured to generate image data by processing signals output from the imaging device.