Organic light-emitting display and method of manufacturing the same
An organic light-emitting display and a method of manufacturing an organic light-emitting display are described. According to an aspect, the organic light-emitting display includes a substrate, a photodiode on the substrate, a planarization layer covering the photodiode, a first electrode on the planarization layer, a pixel defining layer at least partially exposing the first electrode, an organic layer covering the first electrode which is exposed by the pixel defining layer and a second electrode covering the pixel defining layer and the organic layer.
1. An organic light-emitting display comprising:
a substrate;
a photodiode on the substrate;
a planarization layer covering the photodiode;
a first electrode on the planarization layer;
a pixel defining layer at least partially exposing the first electrode;
an organic layer covering the first electrode exposed by the pixel defining layer; and
a second electrode covering the pixel defining layer and the organic layer,
wherein the first electrode comprises a first region overlapping the photodiode and a second region which is a remaining region of the first electrode excluding the first region, and
wherein a thickness of the first region of the first electrode is different from a thickness of the second region of the first electrode.
2. The organic light-emitting display of claim 1 , wherein the first region is thinner than the second region.
3. The organic light-emitting display of claim 1 , wherein the first electrode comprises a reflective electrode.
4. The organic light-emitting display of claim 3 , wherein the first electrode comprises silver (Ag).
5. The organic light-emitting display of claim 1 , further comprising:
a gate insulating layer covering the photodiode; and
an interlayer insulating film covering the gate insulating layer,
wherein the photodiode comprises a portion exposed by the gate insulating layer and the interlayer insulating film, and
wherein the first region overlaps the exposed portion.
6. The organic light-emitting display of claim 5 , wherein a width of the first region is equal to or greater than a width of the exposed portion.
7. The organic light-emitting display of claim 1 ,
wherein the first electrode comprises a first layer first electrode on the planarization layer and a second layer first electrode on the first layer first electrode,
wherein the first layer first electrode has a uniform thickness, and the first region of the second layer first electrode is thinner than the second region of the second layer first electrode.
8. The organic light-emitting display of claim 1 ,
wherein the first electrode comprises a first layer first electrode on the planarization layer, a second layer first electrode on the first layer first electrode, and a third layer first electrode on the second layer first electrode.
9. The organic light-emitting display of claim 8 ,
wherein each of the first layer first electrode and the third layer first electrode has a uniform thickness, and
wherein the first region of the second layer first electrode is thinner than the second region of the second layer first electrode.
10. The organic light-emitting display of claim 9 ,
wherein each of the first layer first electrode and the third layer first electrode comprises a transparent electrode, and
wherein the second layer first electrode comprises a reflective electrode.
11. The organic light-emitting display of claim 10 , wherein the second layer first electrode comprises Ag.
12. A method of manufacturing an organic light-emitting display, the method comprising:
placing a photodiode on a substrate;
forming a planarization layer to cover the photodiode;
placing a first electrode on the planarization layer;
forming a pixel defining layer and at least partially exposing the first electrode;
placing an organic layer on the first electrode exposed by the pixel defining layer; and
forming a second electrode to cover the pixel defining layer and the organic layer,
wherein the placing the first electrode on the planarization layer comprises forming a first region of the first electrode overlapping the photodiode, and forming a second region of the first electrode having a different thickness than the first region, the second region being a remaining region of the first electrode excluding the first region.
13. The method of claim 12 , wherein the forming the first region of the first electrode comprises forming the first region to be thinner than the second region.
14. The method of claim 12 , wherein the placing the first electrode on the planarization layer comprises:
forming a first layer first electrode having a uniform thickness on the planarization layer;
forming a second layer first electrode on the first layer first electrode; and
forming a third layer first electrode on the second layer first electrode.
15. The method of claim 14 ,
wherein each of the first layer first electrode and the third layer first electrode comprises a transparent electrode, and
wherein the second layer first electrode comprises a reflective electrode.
16. The method of claim 15 , wherein the second layer first electrode comprises Ag.
17. The method of claim 14 ,
wherein each of the first layer first electrode and the third layer first electrode has a uniform thickness, and
wherein the first region of the second layer first electrode is thinner than the second region of the second layer first electrode.