Method for making polymer single nanowires and sensors utilizing the same
A method of fabricating polymer single nanowires, comprising the steps of: spin coating a polymethylmethacrylate resist onto a silicon wafer patterned with at least one gold electrode pair; creating a nanochannel using e-beam lithography between each pair of the at least one gold electrode pairs; placing the silicon wafer into an aniline monomer polymerization solution; reacting the polymerization solution to give a coated wafer and a polyaniline film; and cleaning the coated wafer of polymethylmethacrylate resist and polyaniline film to give at least one gold electrode pair with a connecting polymer single nanowire.
1. A method of fabricating a plurality of polymer single nanowires having elevated surface to volume ratios, comprising the steps of:
spin coating a polymethylmethacrylate resist onto a silicon wafer patterned with a plurality of gold electrode pairs;
creating a nanochannel using e-beam lithography between each pair of the plurality of gold electrode pairs;
placing the silicon wafer into a first solution maintained at a temperature between 0° C. and 5° C. and comprising an aniline monomer in an aqueous perchloric acid;
reacting the first solution with a second solution maintained at a temperature between 0° C. and 5° C. and comprising ammonium persulfate in an aqueous perchloric acid to give a polyaniline film coated wafer; and
cleaning the polyaniline film coated wafer of polymethylmethacrylate resist and polyaniline film to give a plurality of gold electrode pairs with a connecting polymer single nanowire having an elevated surface to volume ratio between each of the plurality of gold electrode pairs.
2. The method of claim 1 , wherein each of the polymer single nanowires has a uniform diameter.
3. The method of claim 1 , wherein each polymer single nanowire has a diameter of about 100 nanometers and a length of about 8 micrometers.