IP Library Granted Patent US 9,395,000
Granted Patent B2
US 9,395,000 · App. 14/462,635 · Granted Jul 19, 2016

Apparatus for excluding particle contaminants from a gas lift off mechanical seal

Inventor: Daryl L. Griffith (Three Rivers, MI)
Assignee: Flowserve Management Company
F16J15/40F16J15/3404F16J15/3496
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Quick Facts
Patent No.
US 9,395,000
App. No.
14/462,635
Granted
Jul 19, 2016
Kind
B2
Abstract

A particulate exclusion mechanism for a gas lift off seal includes a band fixed to the stationary seal face and extending over the lift off region between the stationary and rotating seal faces, thereby forming an annular cavity surrounding the lift off region that traps barrier gas therein as it leaks through the lift off region and inhibits process fluid from entering the annular cavity and reaching the lift off region. The band can be made of a non-abrasive material such as PTFE or PEEK. The band can extend over the rotating seal face, and a portion of the band can be sufficiently flexible to allow the extended end of the band to constrict in diameter and contact the rotating seal face if the process pressure exceeds the barrier gas pressure. The extended end can include a thicker terminating portion that minimizes clearance with the rotating seal face.

Claims (21)

1. A lift off seal including a particulate exclusion band, the lift off seal comprising:

a stationary seal face having a substantially cylindrical outer periphery, the stationary seal face terminating at one end in a stationary sealing surface;

a rotating seal face having a substantially cylindrical outer periphery, the rotating seal face terminating at one end in a rotating sealing surface, the stationary and rotating sealing surfaces being closely adjacent to each other so as to form a lift off region therebetween;

a gas barrier region configured to contain pressurized barrier gas, the gas barrier region being in fluid communication with an inner periphery of the lift off region, so that pressurized barrier gas can flow from the barrier gas region into the lift off region, an outer periphery of the lift off region being in fluid communication with a process fluid; and

a particulate exclusion band rotationally fixed to the outer periphery of the stationary seal face, said band being supported entirely by said stationary seal face and extending axially at least over the outer periphery of the lift off region and forming an annular cavity surrounding the outer periphery of the lift off region.

2. The lift off seal of claim 1 , further including a band snap feature located in an inner surface of the band and configured for engagement with a complimentary seal face snap feature included on the outer periphery of the stationary seal face, engagement therebetween being able to maintain the band in a desired position relative to the stationary seal face at least one of axially and circumferentially.

3. The lift off seal of claim 1 , wherein the band is constructed of an abrasion-resistant material.

4. The lift off seal of claim 3 , wherein the abrasion-resistant material is polytetrafluoroethylene (PTFE).

5. The lift off seal of claim 3 , wherein the abrasion-resistant material is polyether ether ketone (PEEK).

6. The lift off seal of claim 1 , wherein the band includes an extended section that extends beyond the lift off region and over at least a portion of the outer periphery of the rotating seal face.

7. The lift off seal of claim 6 , wherein at least a portion of the band is sufficiently thin to enable the extended section to constrict in diameter and contact the outer periphery of the rotating seal face if a pressure of the process fluid exceeds a pressure of the barrier gas by a specified amount.

8. The lift off seal of claim 6 , wherein the extended section of the band further includes a terminating region that is smaller in inner diameter than an outer boundary of the annular cavity.

9. A particulate exclusion mechanism configured for use with a lift off seal that includes a stationary seal face having a substantially cylindrical outer periphery, the stationary seal face terminating at one end in a stationary sealing surface, a rotating seal face having a substantially cylindrical outer periphery, the rotating seal face terminating at one end in a rotating sealing surface, the stationary and rotating sealing surfaces being closely adjacent to each other so as to form a lift off region therebetween, and a gas barrier region configured to contain pressurized barrier gas, the gas barrier region being in fluid communication with an inner periphery of the lift off region, so that pressurized barrier gas can flow from the barrier gas region into the lift off region, an outer periphery of the lift off region being in fluid communication with a process fluid, the exclusion mechanism comprising:

a band rotationally fixable to the outer periphery of the stationary seal face, said band being configured to extend axially at least over the outer periphery of the lift off region so as to form an annular cavity surrounding the outer periphery of the lift off region.

10. The exclusion mechanism of claim 9 , further including a band snap feature located on an inner surface of the band and configured for engagement with a complimentary seal face snap feature included on the outer periphery of the stationary seal face, engagement therebetween being able to maintain the band in a desired position relative to the stationary seal face at least one of axially and circumferentially.

11. The exclusion mechanism of claim 9 , wherein the band is constructed of an abrasion-resistant material.

12. The exclusion mechanism of claim 11 , wherein the abrasion-resistant material is polytetrafluoroethylene (PTFE).

13. The exclusion mechanism of claim 11 , wherein the abrasion-resistant material is polyether ether ketone (PEEK).

14. The exclusion mechanism of claim 9 , wherein the band includes an extended section that is configured to extend beyond the lift off region and over a portion of the outer periphery of the rotating seal face.

15. The exclusion mechanism of claim 14 , wherein at least a portion of the band is sufficiently thin to enable the extended section to constrict in diameter and contact the outer periphery of the rotating seal face if a pressure of the process fluid exceeds a pressure of the barrier gas by a specified amount.

16. The exclusion mechanism of claim 14 , wherein the extended section of the band further includes a terminating region that is smaller in inner diameter than an outer boundary of the annular cavity.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 12, 2023
From: FLOWSERVE MANAGEMENT COMPANY
To: FLOWSERVE PTE. LTD.
Reel/Frame 063309/0644 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 19, 2014
From: GRIFFITH, DARYL L.
To: FLOWSERVE MANAGEMENT COMPANY
Reel/Frame 033560/0922 →
Continuity (1)
Related Publication 20160053896A1 · Feb 25, 2016