OLED array substrate
The present invention provides an OLED array substrate, a manufacturing method of the same, a display panel, and a display device, and relates to the field of active matrix organic light-emitting diode (AMOLED) display technology. The present invention can solve the problem that turn-on and turn-off of a switching thin film transistor and grayscale control cannot be performed effectively because the switching thin film transistor and a driving thin film transistor are manufactured as thin film transistors having same performance parameters in an existing OLED array substrate. The OLED array substrate according to the present invention includes a switching thin film transistor and a driving thin film transistor, wherein, an S factor of the switching thin film transistor is less than that of the driving thin film transistor.
1. An OLED array substrate including a switching thin film transistor and a driving thin film transistor, wherein, an S factor of the switching thin film transistor is less than that of the driving thin film transistor;
wherein, the switching thin film transistor and the driving thin film transistor respectively include an active region, a gate, and a gate insulating layer insulatedly separating the active region and the gate from each other, the gate insulating layer of the driving thin film transistor has a first thickness, and the gate insulating layer of the switching thin film transistor has a second thickness;
wherein, the second thickness of the gate insulating layer of the switching thin film transistor ranges from 600 nm to 800 nm; and
the first thickness of the gate insulating layer of the driving thin film transistor ranges from 800 nm to 2000 nm.
2. The OLED array substrate according to claim 1 , wherein, the switching thin film transistor is a top-gate type thin film transistor or a bottom-gate type thin film transistor; and
the driving thin film transistor is a top-gate type thin film transistor or a bottom-gate type thin film transistor.