Method for the production of a wavelength conversion element, wavelength conversion element, and component comprising the wavelength conversion element

1. A method for producing a wavelength conversion element, having the method steps:

A) providing a wavelength conversion layer having a first surface and a second surface opposite the first surface, the second surface being arranged on a carrier layer,

B) treating the first surface with a plasma,

C) stamping at least the wavelength conversion layer, wherein at least one wavelength conversion element having a first surface and an opposite second surface is obtained.

2. The method according to claim 1 , wherein the carrier layer is removed after method step B).

3. The method according to claim 1 , wherein the second surface of the wavelength conversion layer is treated with a plasma in a method step B 1 ) following method step B).

4. The method according to claim 1 , wherein, in method step C), the wavelength conversion layer is stamped and the wavelength conversion element is collected in a container.

5. The method according to claim 1 , wherein, in method step C), the wavelength conversion layer is stamped and the wavelength conversion element is arranged with the second surface on an auxiliary layer.

6. The method according to claim 1 , wherein, in method step C), the wavelength conversion layer and the carrier layer are stamped and the wavelength conversion element arranged on the stamped carrier layer is obtained.

7. The method according to claim 1 , wherein in method step C), the stamped carrier layer is arranged with the side facing away from the wavelength conversion element on an adhesive layer.

8. The method according to claim 7 , wherein, in a method step C 1 ) following method step C), an auxiliary layer is arranged on the first surface of the wavelength conversion element and the adhesive layer is removed.

9. The method according to claim 1 , wherein a stamping tool that has an internal shape which is selected from quadrilateral, round, quadrilateral with at least one recess, and round with at least one recess, is used in method step C).

10. A wavelength conversion element which is produced by a method according to claim 1 .

11. A wavelength conversion element comprising a first surface and a second surface opposite the first surface, the first surface and/or the second surface being vitrified by a vitrification, such that the wavelength conversion element comprises a glass material starting from the first surface and/or the second surface in a vertical direction as far as a penetration depth of the vitrification, and beyond the penetration depth of the vitrification comprises a material which is stickier than the glass material.

12. The wavelength conversion element according to claim 11 , which has sharp edges on the side of the first and/or second surface.

13. The wavelength conversion element according to claim 11 , which has a thickness which is selected from the range of 30μm to 300μm.

14. The wavelength conversion element according to claim 11 , wherein the penetration depth corresponds to at most 2% of the thickness of the wavelength conversion element.

15. The wavelength conversion element according to claim 11 , which has an area that is selected from the range of 0.1 mm 2 to 20 mm 2 .

16. An optoelectronic component comprising a radiation-emitting semiconductor chip and a wavelength conversion element according to claim 1 , which is arranged with the first surface or the second surface on the semiconductor chip in the beam path of the semiconductor chip.

17. The optoelectronic component according to claim 16 , furthermore comprising a potting which encloses the semiconductor chip and is flush with the second surface or the first surface of the wavelength conversion element.