Capacitor structure and method of manufacturing the same

1. A capacitor structure, comprising:

a dielectric layer, located on a substrate;

a first conductive layer, located in the dielectric layer; and

a cup-shaped capacitor, penetrating through the first conductive layer and located in the dielectric layer, wherein the cup-shaped capacitor comprises:

a bottom electrode, wherein two sidewalls of the bottom electrode are electrically connected to the first conductive layer;

a capacitor dielectric layer, covering a surface of the bottom electrode;

a top electrode, covering a surface of the capacitor dielectric layer, wherein the capacitor dielectric layer is disposed between the top electrode and the bottom electrode, and a top surface of the bottom electrode is lower than a top surface of the top electrode; and

a plurality of vias disposed in the dielectric layer at a side of the cup-shaped capacitor, wherein one of the vias is electrically connected to the bottom electrode through the first conductive layer.

2. The capacitor structure as claimed in claim 1 , wherein a distance is kept between the top surface of the bottom electrode and the top surface of the top electrode, and the distance is in a range from 0.01 μm to 2000 μm.

3. The capacitor structure as claimed in claim 1 , further comprising:

a second conductive layer, disposed on the cup-shaped capacitor, wherein the second conductive layer is electrically connected to the top electrode.

4. The capacitor structure as claimed in claim 3 , further comprising a plug disposed between the top electrode and the second conductive layer, wherein the top electrode surrounds the plug, and the plug is electrically connected to the second conductive layer.

5. The capacitor structure as claimed in claim 3 , wherein the capacitor dielectric layer further extends to a top surface of the dielectric layer, and the capacitor dielectric layer is disposed between the second conductive layer and the dielectric layer.

6. The capacitor structure as claimed in claim 1 , further comprising a blocking layer disposed below the cup-shaped capacitor.

7. The capacitor structure as claimed in claim 1 , wherein materials of the bottom electrode and the top electrode comprise titanium nitride, tantalum nitride, tungsten, titanium tungsten, aluminum, copper, or a combination thereof.

8. The capacitor structure as claimed in claim 1 , wherein a material of the capacitor dielectric layer comprises low-temperature oxide, nitride, or a combination thereof.

9. A method of manufacturing a capacitor structure, comprising:

forming a dielectric layer on a substrate;

forming a first conductive layer in the dielectric layer;

forming a cup-shaped capacitor in the dielectric layer, wherein the cup-shaped capacitor penetrates through the first conductive layer, and the cup-shaped capacitor comprises:

a bottom electrode, wherein two sidewalls of the bottom electrode are electrically connected to the first conductive layer;

a capacitor dielectric layer, covering a surface of the bottom electrode; and

a top electrode, covering a surface of the capacitor dielectric layer, wherein the capacitor dielectric layer is disposed between the top electrode and the bottom electrode, and a top surface of the bottom electrode is lower than a top surface of the top electrode; and

forming a plurality of vias in the dielectric layer at a side of the cup-shaped capacitor, wherein one of the vias is electrically connected to the bottom electrode through the first conductive layer.

10. The method of manufacturing the capacitor structure as claimed in claim 9 , after forming the cup-shaped capacitor in the dielectric layer, further comprising forming a second conductive layer on the cup-shaped capacitor, wherein the second conductive layer is electrically connected to the top electrode.

11. The method of manufacturing the capacitor structure as claimed in claim 9 , wherein the step of forming the cup-shaped capacitor in the dielectric layer comprises:

forming a first opening in the dielectric layer, wherein the first opening penetrates through the first conductive layer;

forming a bottom electrode material layer in the first opening;

forming a photoresist layer on the dielectric layer, wherein the photoresist layer is filled into the first opening and covers a surface of the bottom electrode material layer;

removing a portion of the photoresist layer and a portion of the bottom electrode material layer, so as to expose a portion of a sidewall of the first opening, and forming the bottom electrode in the first opening;

removing the photoresist layer;

forming a capacitor dielectric material layer on the dielectric layer, wherein the capacitor dielectric material layer at least covers the surface of the bottom electrode and a portion of the sidewall of the first opening;

forming a top electrode material layer on the dielectric layer, wherein the top electrode material layer covers a surface of the capacitor dielectric material layer; and

performing a planarization process to remove the top electrode material layer on a top surface of the dielectric layer.

12. The method of manufacturing the capacitor structure as claimed in claim 11 , wherein the step of forming the vias in the dielectric layer at the side of the cup-shaped capacitor comprises: after forming the capacitor dielectric material layer on the dielectric layer, forming a plurality of via openings in the dielectric layer at the side of the cup-shaped capacitor.

13. The method of manufacturing the capacitor structure as claimed in claim 12 , in the step of forming the top electrode material layer on the dielectric layer, wherein the top electrode material layer further extends to cover surfaces of the via openings.

14. The method of manufacturing the capacitor structure as claimed in claim 13 , after forming the cup-shaped capacitor in the dielectric layer, the method further comprises:

forming a conductive material layer on the dielectric layer, wherein the conductive material layer is filled into the first opening to form a plug, the conductive material layer is filled into the via openings.

15. The method of manufacturing the capacitor structure as claimed in claim 14 , wherein a material of the conductive material layer comprises titanium nitride, tantalum nitride, tungsten, titanium tungsten, aluminum, copper, or a combination thereof.

16. The method of manufacturing the capacitor structure as claimed in claim 11 , wherein the step of forming the first opening in the dielectric layer comprises:

forming a patterned mask layer on the dielectric layer;

using the first conductive layer as an etch stop layer, performing a first etching process to remove a portion of the dielectric layer; and

performing a second etching process to remove a portion of the first conductive layer, so as to penetrate through the first conductive layer.

17. The method of manufacturing the capacitor structure as claimed in claim 11 , before forming the first conductive layer in the dielectric layer, the method further comprising forming a blocking layer below the cup-shaped capacitor.

18. The method of manufacturing the capacitor structure as claimed in claim 17 , wherein the step of forming the first opening in the dielectric layer comprises:

forming a patterned mask layer on the dielectric layer; and

using the blocking layer as an etch stop layer, performing a third etching process to remove a portion of the dielectric layer, wherein the first conductive layer has at least one second opening, and the second opening corresponds to the first opening.

19. The method of manufacturing the capacitor structure as claimed in claim 11 , wherein the planarization process comprises a chemical mechanical polishing process.