IP Library Granted Patent US 9,711,486
Granted Patent B2
US 9,711,486 · App. 14/991,465 · Granted Jul 18, 2017

Stacked semiconductor device

Inventor: Toshiaki Nagai (Yokohama, JP)
Assignee: FUJITSU LIMITED
H01L25/0657H01L23/5223H01L23/5228H01L23/642H01L23/647H01L2225/06527H01L2225/06541
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Quick Facts
Patent No.
US 9,711,486
App. No.
14/991,465
Granted
Jul 18, 2017
Kind
B2
Abstract

A stacked semiconductor device includes: a plurality of stacked integrated-circuit chips that are to be mounted onto a substrate and including at least one power-supply target chip; a decoupling through-electrode transmission line including a decoupling power-supply-side through-electrode wiring line coupled to a power-supply terminal of the at least one power-supply target chip and a decoupling ground-side through-electrode wiring line coupled to a ground terminal of the at least one power-supply target chip; a resistor and a capacitor provided one of the a plurality of integrated-circuit chips that is located at a termination of the decoupling through-electrode transmission line, the resistor having an impedance substantially equal to a characteristic impedance of the decoupling through-electrode transmission line, wherein the resistor and the capacitor are coupled in series.

Claims (15)

1. A stacked semiconductor device comprising:

a plurality of stacked integrated-circuit chips that are to be mounted onto a substrate and including at least one power-supply target chip;

a decoupling through-electrode transmission line including a decoupling power-supply-side through-electrode wiring line coupled to a power-supply terminal of the at least one power-supply target chip and a decoupling ground-side through-electrode wiring line coupled to a ground terminal of the at least one power-supply target chip;

a resistor and a capacitor provided on one of the plurality of stacked integrated-circuit chips that is located at a termination of the decoupling through-electrode transmission line, the resistor having an impedance substantially equal to a characteristic impedance of the decoupling through-electrode transmission line, wherein the resistor and the capacitor are coupled in series.

2. The stacked semiconductor device according to claim 1 , wherein a first end of the resistor is coupled to one of the power-supply terminal and the ground terminal, a second end of the resistor is coupled to a first end of the capacitor, and a second end of the capacitor is coupled to the another of the power-supply terminal and the ground terminal.

3. The stacked semiconductor device according to claim 1 , wherein another decoupling through-electrode transmission line is arranged along with the decoupling through-electrode transmission lines.

4. The stacked semiconductor device according to claim 1 , wherein the at least one power-supply target chip includes a power-supply-side wiring line coupled to the power-supply terminal, a ground-side wiring line coupled to the ground terminal, and a terminal-side transmission line having a characteristic impedance substantially equal to the characteristic impedance of the decoupling through-electrode transmission line, and wherein the power-supply terminal and the ground terminal are coupled to the decoupling through-electrode transmission line through the terminal-side transmission line.

5. The stacked semiconductor device according to claim 1 , wherein the decoupling ground-side through-electrode wiring line is provided around the decoupling power-supply-side through-electrode wiring line.

6. The stacked semiconductor device according to claim 1 , wherein the decoupling through-electrode transmission line extends toward a portion above the at least one power-supply target chip, and wherein the resistor and the capacitor are provided in a highest integrated-circuit chip of the plurality of stacked integrated-circuit chips.

7. The stacked semiconductor device according to claim 1 , wherein the decoupling through-electrode transmission line extends toward a portion below the at least one power-supply target chip, and wherein the resistor and the capacitor are provided in a lowest integrated-circuit chip of the plurality of stacked integrated-circuit chips.

8. The stacked semiconductor device according to claim 7 , wherein the lowest integrated-circuit chip includes a power-supply wiring line, a ground wiring line, and a low-pass filter, and wherein the decoupling power-supply-side through-electrode wiring line and the decoupling ground-side through-electrode wiring line are coupled, at the termination of the decoupling through-electrode transmission line, to the power-supply wiring line and the ground wiring line, respectively, through the low-pass filter.

9. The stacked semiconductor device according to claim 1 , wherein the decoupling through-electrode transmission line includes an upper decoupling through-electrode transmission line extending toward a portion above the at least one power-supply target chip and a lower decoupling through-electrode transmission line extending toward a portion below the at least one power-supply target chip, the resistor and the capacitor includes an upper resistor and a upper capacitor provided in a highest stacked integrated-circuit chip of the plurality of integrated-circuit chips and coupled to a termination of the upper decoupling through-electrode transmission line and a lower resistor and a lower capacitor provided in a lowest stacked integrated-circuit chip of the plurality of integrated-circuit chips and coupled to a termination of the lower decoupling through-electrode transmission line, the upper resistor having an impedance substantially equal to a characteristic impedance of the upper decoupling through-electrode transmission line, and the lower resistor having an impedance substantially equal to the characteristic impedance of the lower decoupling through-electrode transmission line.

10. The stacked semiconductor device according to claim 9 , wherein the lowest integrated-circuit chip includes a power-supply wiring line, a ground wiring line, and a low-pass filter, and wherein the decoupling power-supply-side through-electrode wiring line and the decoupling ground-side through-electrode wiring line, at the termination of the lower decoupling through-electrode transmission line, to the power-supply wiring line and the ground wiring line, respectively, through the low-pass filter.

11. The stacked semiconductor device according to claim 1 , wherein one of the a plurality of stacked integrated-circuit chips includes a termination-side transmission line having a characteristic impedance substantially equal to the characteristic impedance of the decoupling through-electrode transmission line, and wherein the resistor and the capacitor are coupled to the termination of the decoupling through-electrode transmission line through the termination-side transmission line.

12. The stacked semiconductor device according to claim 1 , further comprising: an adjustment capacitor, coupled between the decoupling power-supply-side through-electrode wiring line and the decoupling ground-side through-electrode wiring line, configured to adjust the characteristic impedance of the decoupling through-electrode transmission line.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 11, 2016
From: NAGAI, TOSHIAKI
To: FUJITSU LIMITED
Reel/Frame 037448/0735 →
Priority Claims (1)
JP 2015-021119 · Feb 5, 2015 · national
Continuity (1)
Related Publication 20160233195A1 · Aug 11, 2016