Non-volatile semiconductor memory with high reliability and data erasing method thereof

1. A data erasing method of a non-volatile semiconductor memory apparatus, wherein memory cells are formed in the non-volatile semiconductor memory apparatus, and each of the memory cells comprises a control gate, a charge accumulation layer and a channel region, the data erasing method comprising:

after maintaining the control gate at a fixed voltage and applying a high-voltage first erase pulse to the channel region, so as to emit electrons from the charge accumulation layer to the channel region, maintaining the control gate at the fixed voltage and applying a first weak erase pulse with a voltage lower than the voltage of the first erase pulse to the channel region, wherein the voltages of the first erase pulse and the first weak erase pulse are positive; and

performing a first erase verification of determining whether the data erasing is qualified, wherein the first erase verification is performed after the first erase pulse and the first weak pulse are applied, wherein the first weak erase pulse is immediately applied following the first erase pulse, the first weak erase pulse and the first erase pulse are considered as a set, and then the first erase verification is performed after the set of the first weak erase pulse and the first erase pulse,

wherein when the data erasing is determined as disqualified through the first erase verification, maintaining the control gate at the fixed voltage and applying a second erase pulse with a voltage greater than the voltage of the first erase pulse to the channel region, and maintaining the control gate at the fixed voltage and applying a second weak erase pulse with a voltage lower than the voltage of the second erase pulse to the channel region, wherein the voltages of the second weak erase pulse is larger than or equal to the voltage of first weak erase pulse.

2. The data erasing method according to claim 1 , wherein the first weak erase pulse is applied in a fixed period after the first erase pulse is applied.

3. The data erasing method according to claim 1 , wherein during the process of applying the first erase pulse, the first weak erase pulse is applied through reducing a peak of the first erase pulse.

4. The data erasing method according to claim 1 , wherein the first weak erase pulse has a size that does not cause the electrons to emit from the charge accumulation layer toward the channel region.

5. The data erasing method according to claim 2 , wherein the first weak erase pulse has a size that does not cause the electrons to emit from the charge accumulation layer toward the channel region.

6. The data erasing method according to claim 3 , wherein the first weak erase pulse has a size that does not cause the electrons to emit from the charge accumulation layer toward the channel region.

7. A data erasing method of a non-volatile semiconductor memory apparatus, wherein memory cells are formed in the non-volatile semiconductor memory apparatus, and each of the memory cells comprises a control gate, a charge accumulation layer and a channel region, the data erasing method comprising:

after maintaining the control gate at a fixed voltage and applying a high-voltage erase pulse to the channel region, so as to emit electrons from the charge accumulation layer to the channel region, applying a weak pulse with a voltage lower than the voltage of the erase pulse to the control gate during the process of applying the erase pulse.

8. A non-volatile semiconductor memory apparatus, comprising:

a memory cell array, comprising memory cells formed therein, wherein each of the memory cells comprises a control gate, a charge accumulation layer and a channel region;

a selection portion, selecting a memory cell with data to be erased from the memory cell array; and

a control portion, controlling the data erasing performed on the memory cell selected by the selection portion,

wherein after the control portion maintains the control gate at a fixed voltage, applies a high-voltage first erase pulse to the channel region, so as to emit electrons from the charge accumulation layer to the channel region, the control portion maintains the control gate at the fixed voltage and applying a first weak erase pulse with a voltage lower than the first erase pulse to the channel region, wherein the voltages of the first erase pulse and the first weak erase pulse are positive,

wherein the control portion performs a first erase verification of determining whether the data erasing is qualified, wherein the first erase verification is performed after the first erase pulse and the first weak pulse are applied, wherein the first weak erase pulse is immediately applied following the first erase pulse, the first weak erase pulse and the first erase pulse are considered as a set, and then the first erase verification is performed after the set of the first weak erase pulse and the first erase pulse,

wherein when the data erasing is determined as disqualified through the first erase verification, the control portion maintains the control gate at the fixed voltage and applies a second erase pulse with a voltage greater than the voltage of the first erase pulse to the channel region, and then maintains the control gate at the fixed voltage and applies a second weak erase pulse with a voltage lower than the voltage of the second erase pulse to the channel region, wherein the voltages of the second weak erase pulse is larger than or equal to the voltage of first weak erase pulse.

9. The non-volatile semiconductor memory apparatus according to claim 8 , wherein the control portion applies the first weak erase pulse in a fixed period after applying the first erase pulse.

10. The non-volatile semiconductor memory apparatus according to claim 8 , wherein the control portion applies the first weak erase pulse through reducing a peak value of the first erase pulse during the process of applying the erase pulse.

11. The non-volatile semiconductor memory apparatus according to claim 8 , wherein the first weak erase pulse has a magnitude that does not cause the electrons to emit from the charge accumulation layer toward the channel region.

12. The non-volatile semiconductor memory apparatus according to claim 8 , wherein the memory cell array comprises a NAND string formed by a plurality of memory cells connected in serial, wherein the selection portion selects a block from the memory cell array, and the control portion applies the first erase pulse and the first weak erase pulse to the selected block.

13. The non-volatile semiconductor memory apparatus according to claim 8 , wherein the memory cell array comprises a NAND string formed by a plurality of memory cells connected in serial, wherein the selection portion selects a block from the memory cell array, and the control portion applies the first erase pulse to the selected block and applies the first weak erase pulse to a control gate of a memory cell in the selected block during the process of applying the erase pulse.

14. A non-volatile semiconductor memory apparatus, comprising:

a memory cell array, comprising memory cells formed therein, wherein each of the memory cells comprises a control gate, a charge accumulation layer and a channel region;

a selection portion, selecting a memory cell with data to be erased from the memory cell array; and

a control portion, controlling the data erasing performed on the memory cell selected by the selection portion,

wherein the control portion maintains the control gate at a fixed voltage, applies a high-voltage erase pulse to the channel region, and applies a weak pulse with a voltage lower than the erase pulse to the control gate during the process of applying the erase pulse after emitting electrons from the charge accumulation layer to the channel region.