Photo-curing process for metallic inks
A solution of metal ink is mixed and then printed or dispensed onto the substrate using the dispenser. The film then is dried to eliminate water or solvents. In some cases, a thermal curing step can be introduced subsequent to dispensing the film and prior to the photo-curing step. The substrate and deposited film can be cured using an oven or by placing the substrate on the surface of a heater, such as a hot plate. Following the drying and/or thermal curing step, a laser beam or focused light from the light source is directed onto the surface of the film in a process known as direct writing. The light serves to photo-cure the film such that it has low resistivity.
1. A method comprising:
depositing a pattern of metallic ink comprising copper nanoparticles that contain copper oxides;
photosintering the metallic ink, wherein the photosintering comprises radiating the copper nanoparticles containing the copper oxides with a photonic energy greater than band gap energies of the copper oxides to thereby photo-reduce the copper oxides contained in the copper nanoparticles to metallic copper; and
drying the metallic ink between the depositing and photosintering steps, wherein the drying and photosintering is performed in ambient air.
2. The method of claim 1 , wherein an average size of the copper nanoparticles in the metallic ink is in a range of 50 nanometers to 120 nanometers, inclusive thereof.
3. The method of claim 1 , wherein an average size of the copper nanoparticles in the metallic ink is in a range of 50 nanometers to 70 nanometers, inclusive thereof.
4. The method of claim 1 , wherein a visible color of the metallic ink is brown or red-brown.
5. The method of claim 1 , wherein the photosintering is performed with a UV lamp with a wavelength of about 100-400 nm.
6. The method of claim 5 , wherein the UV lamp contains a decaying excimer complexes.
7. The method of claim 1 , wherein plasmon oscillations of the nanoparticles contributes to their absorption of energy during the photosintering.
8. The method of claim 1 , wherein the photosintering photo-cures the metallic ink.
9. The method of claim 1 , wherein the photosintering lowers the electrical resistivity of the deposited metallic ink.
10. The method of claim 1 , wherein the photosintering further comprises fusing together the copper nanoparticles simultaneously with the photo-reduction of the copper oxides contained in the copper nanoparticles.
11. The method of claim 10 , wherein the metallic copper photo-reduced from the copper oxides contained in the copper nanoparticles melts on surfaces of the copper nanoparticles to thereby begin the fusing together of the copper nanoparticles within the deposited metallic ink.
12. The method of claim 1 , wherein the photo-reduction of the copper oxides contained in the copper nanoparticles adds electrons to surfaces of the copper nanoparticles thereby increasing an absorption of the photonic energy by the copper nanoparticles.
13. The method of claim 1 , wherein the metallic ink comprises IPA, hexylamine, and the copper nanoparticles containing the copper oxides.
14. The method of claim 1 , wherein the copper oxides contained in the copper nanoparticles comprise Cu 2 O.
15. The method of claim 14 , wherein an x-ray diffraction net counts ratio of metallic copper to Cu 2 O is 13:1 after the photosintering of the deposited metallic ink.
16. The method of claim 15 , wherein the x-ray diffraction net counts ratio of metallic copper to Cu 2 O was 2.1:1 before the photosintering of the deposited metallic ink.
17. The method of claim 1 , wherein the band gap energies of the copper oxides contained in the copper nanoparticles are greater than enthalpies of formation of the copper oxides.
18. The method of claim 1 , wherein a voltage of the photosintering is 1200 volts.
19. The method of claim 1 , wherein a resistivity of the photosintered metallic ink is in a range of 3.15×10 −6 ohm-cm to 8.25×10 −6 ohm-cm with a blow off of less than or equal to 5% of the photosintered metallic ink from a substrate on which the metallic ink is deposited.
20. The method of claim 4 , wherein a resistivity of the photosintered metallic ink is in a range of 5×10 −6 ohm-cm to 92×10 −6 ohm-cm.
21. A method comprising:
depositing a pattern of metallic ink comprising copper nanoparticles that contain copper oxides;
photosintering the metallic ink, wherein the photosintering comprises radiating the copper nanoparticles containing the copper oxides with a photonic energy greater than band gap energies of the copper oxides to thereby photo-reduce the copper oxides contained in the copper nanoparticles to metallic copper; and
drying the metallic ink between the depositing and photosintering steps wherein the photosintering is performed in ambient air.
22. A method comprising:
depositing a pattern of metallic ink comprising copper nanoparticles that contain copper oxides;
photosintering the metallic ink, wherein the photosintering comprises radiating the copper nanoparticles containing the copper oxides with a photonic energy greater than band gap energies of the copper oxides to thereby photo-reduce the copper oxides contained in the copper nanoparticles to metallic copper, wherein the photo-reducing of the copper oxides to metallic copper is performed in ambient air.