High efficiency wide spectrum sensor
An optical sensor including a first material layer comprising at least a first material; a second material layer comprising at least a second material that is different from the first material, where a material bandgap of the first material is larger than a material bandgap of the second material; and a graded material layer arranged between the first material layer and the second material layer, the graded material layer comprising an alloy of at least the first material and the second material having compositions of the second material that vary along a direction that is from the first material to the second material.
1. An optical sensor comprising:
a first material layer comprising at least a first material, wherein the first material layer comprises an alloy of germanium and silicon having a first germanium composition;
a second material layer comprising at least a second material that is different from the first material, wherein a material bandgap of the first material is larger than a material bandgap of the second material, wherein the second material layer comprises an alloy of germanium and silicon having a second germanium composition, and wherein the first germanium composition is lower than the second germanium composition; and
a graded material layer arranged between the first material layer and the second material layer, the graded material layer comprising an alloy of at least the first material and the second material having compositions of the second material that vary along a direction that is from the first material to the second material, wherein the germanium compositions of the graded material layer are between the first germanium composition and the second germanium composition.
2. The optical sensor of claim 1 , wherein the first material is silicon and the second material is germanium.
3. The optical sensor of claim 2 , wherein the compositions of germanium of the graded material increase along the direction that is from the first material to the second material.
4. The optical sensor of claim 1 , wherein the first material layer and the second material layer are doped.
5. The optical sensor of claim 1 , further comprising:
a substrate; and
circuitry arranged over the substrate,
wherein the second material layer is arranged over the circuitry, and
wherein the first material layer is arranged over the second material layer.
6. An optical sensor comprising:
a first graded material layer comprising a composition of at least a first material and a second material, wherein compositions of the second material of the first graded material layer vary along a particular direction, and wherein the first material is silicon and the second material is germanium;
a second graded material layer comprising a composition of at least the first material and the second material, wherein compositions of the second material of the second graded material layer vary along the particular direction; and
a third material layer arranged between the first graded material layer and the second graded material layer, the third material layer comprising at least the second material,
wherein the particular direction is a direction from the first graded material layer to the second graded material layer,
wherein the compositions of germanium of the first graded material layer increase along the particular direction, and
wherein the compositions of germanium of the second graded material layer decrease along the particular direction.
7. The optical sensor of claim 6 ,
wherein the first graded material layer further comprises multiple p-doped levels along the particular direction, and
wherein the second graded material layer further comprises multiple n-doped levels along the particular direction.
8. The optical sensor of claim 6 , comprising conductor layers configured to provide a bias the optical sensor.
9. An optical sensor comprising:
a first graded germanium layer comprising multiple p-doped levels along a particular direction;
a second graded germanium layer comprising multiple n-doped levels along the particular direction;
a third germanium layer arranged between the first graded germanium layer and the second graded germanium layer; and
conductor layers configured to provide a bias to the optical sensor.
10. An optical sensor comprising:
an absorption material layer configured to receive light to generate photocurrent and dark current;
an energy filter layer configured to receive the photocurrent and the dark current, the energy filter layer having an energy state that is between an energy state of the photocurrent and an energy state of the dark current, such that the energy filter layer is configured to block the dark current and to pass the photocurrent; and
a carrier collector layer configured to receive the photocurrent passed through the energy filter layer.
11. An optical sensor comprising:
a first graded material layer comprising a composition of at least a first material and a second material, wherein compositions of the second material of the first graded material layer vary along a particular direction, wherein the first material is silicon and the second material is germanium, and wherein the first graded material layer further comprises multiple p-doped levels along the particular direction;
a second graded material layer comprising a composition of at least the first material and the second material, wherein compositions of the second material of the second graded material layer vary along the particular direction, and wherein the second graded material layer further comprises multiple n-doped levels along the particular direction; and
a third material layer arranged between the first graded material layer and the second graded material layer, the third material layer comprising at least the second material.