Nonvolatile memory devices having variable resistive load portion

1. A nonvolatile memory device comprising:

a nonvolatile memory cell; and

a variable resistive load portion coupled between a bit line of the nonvolatile memory cell and a supply voltage line, the variable resistive load portion being suitable for changing a resistance value between the bit line and the supply voltage line according to a level of a supply voltage applied to the supply voltage line,

wherein the variable resistive load portion includes:

a resistive load portion including a first resistive load element and a second resistive load element which are coupled in parallel between the supply voltage line and the bit line; and

a bias generator suitable for changing the second resistive load element into an open circuit when the level of the supply voltage is lower than a predetermined level.

2. The nonvolatile memory device of claim 1 , wherein the nonvolatile memory cell includes a first P-channel transistor having a floating gate, a source, and a drain coupled to a ground terminal.

3. The nonvolatile memory device of claim 2 , wherein the nonvolatile memory cell further includes a selection transistor coupled between the bit line and the source of the first P-channel transistor.

4. The nonvolatile memory device of claim 3 , wherein the selection transistor includes a second P-channel transistor having a source coupled to the bit line, a drain coupled to the source of the first P-channel transistor, and a gate to which a first enablement signal is applied.

5. The nonvolatile memory device of claim 1 , wherein the first resistive load element has a resistance value which is higher than a resistance value of the second resistive load element when the level of the supply voltage is higher than a predetermined level.

6. The nonvolatile memory device of claim 1 , wherein the first resistive load element and the second resistive load element include a third P-channel transistor and a fourth P-channel transistor, respectively.

7. The nonvolatile memory device of claim 6 ,

wherein the third P-channel transistor operates in a saturation region, and

wherein the fourth P-channel transistor is turned on or off according to an output voltage of the bias generator.

8. The nonvolatile memory device of claim 7 ,

wherein the third P-channel transistor includes a source coupled to the supply voltage line, a gate coupled to the bit line, and a drain coupled to the bit line, and

wherein the fourth P-channel transistor includes a source coupled to the supply voltage line, a gate to which the output voltage of the bias generator is applied, and a drain coupled to the bit line.

9. The nonvolatile memory device of claim 8 , wherein the third P-channel transistor has a trans-conductance which is less than a trans-conductance of the fourth P-channel transistor.

10. The nonvolatile memory device of claim 8 , wherein a ratio of a channel length to a channel width of the third P-channel transistor is greater than a ratio of a channel length to a channel width of the fourth P-channel transistor.

11. The nonvolatile memory device of claim 8 , wherein the bias generator includes a resistor and a first N-channel transistor coupled in series between the supply voltage line and a ground terminal.

12. The nonvolatile memory device of claim 11 , wherein the first N-channel transistor includes a gate and a drain which are connected to each other to have a diode-connected structure.

13. The nonvolatile memory device of claim 12 ,

wherein the bias generator generates an output voltage through a node to which one end of the resistor and the drain of the first N-channel transistor are connected; and

wherein the output voltage of the bias generator is applied to the gate of the fourth P-channel transistor.

14. The nonvolatile memory device of claim 8 , wherein the bias generator includes a resistor and a plurality of first N-channel transistors which are coupled in series between the supply voltage line and a ground terminal.

15. The nonvolatile memory device of claim 14 , wherein each of the plurality of first N-channel transistors includes a gate and a drain which are connected to each other to have a diode-connected structure.

16. The nonvolatile memory device of claim 1 ,

wherein the first resistive load element includes a first load resistor having a first resistance value; and

wherein the second resistive load element includes a second load resistor and a switching transistor which are coupled in series.

17. The nonvolatile memory device of claim 16 , wherein the switching transistor includes a P-channel transistor having a gate to which an output voltage of the bias generator is applied, a source coupled to the second load resistor, and a drain coupled to the bit line.

18. The nonvolatile memory device of claim 1 , further comprising a sensing circuit including a complementary MOS inverter and coupled to the bit line.

19. The nonvolatile memory device of claim 1 , further comprising a read disturbance suppression transistor coupled between the bit line and the variable resistive load portion.

20. The nonvolatile memory device of claim 19 , wherein the read disturbance suppression transistor includes an N-channel transistor that includes a drain coupled to the variable resistive load portion, a source coupled to the bit line, and a gate to which a sense amplifier enablement signal is applied.

21. The nonvolatile memory device of claim 20 , further comprising a sensing circuit including a complementary MOS inverter and coupled to the drain of the read disturbance suppression transistor.