IP Library Granted Patent US 9,899,439
Granted Patent B2
US 9,899,439 · App. 14/842,066 · Granted Feb 20, 2018

Image sensor including micro-lenses having high refractive index and image processing system including the same

Inventor: Naoyuki Miyashita (Hwaseong-si, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
H01L27/14621G02B3/0006G02B5/201G02B13/0085H01L27/1463H01L27/1464H01L27/14627H01L27/14643
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Quick Facts
Patent No.
US 9,899,439
App. No.
14/842,066
Granted
Feb 20, 2018
Kind
B2
Abstract

Provided are an image sensor with micro-lenses having a high refractive index and an image processing system including the same. The image sensor includes: a semiconductor substrate in which a photoelectric conversion device is formed; at least one color filter formed on the semiconductor substrate; at least one color filter fence formed on the semiconductor substrate and between two neighboring color filters among the at least one color filter; and at least one micro-lens formed on the color filter, respectively. The micro-lens has a first refractive index equal to or greater than a first threshold. The filter fence has a second refractive index less than or equal to a second threshold. The second threshold is less than the first threshold.

Claims (56)

1. An image sensor comprising:

a semiconductor substrate in which a photoelectric conversion device is formed;

at least one color filter formed on the semiconductor substrate;

a first flat layer formed on the at least one color filter;

at least one micro-lens formed on the first flat layer,

wherein the at least one micro-lens has a first refractive index equal to or greater than a threshold which is greater than a second refractive index of the at least one color filter, and

wherein a third refractive index of the first flat layer is equal to the first refractive index.

2. The image sensor of claim 1 , wherein the first refractive index of the at least one micro-lens is in a first range of 1.8 to 2.5, and

wherein the second refractive index of the at least one color filter is in a second range of 1.5 to 1.7.

3. The image sensor of claim 1 , further comprising:

a second flat layer formed on the semiconductor substrate and below the at least one color filter.

4. The image sensor of claim 3 , wherein a fourth refractive index of the second flat layer is equal to the first refractive index of the at least one micro-lens.

5. An image sensor comprising:

a semiconductor substrate in which a photoelectric conversion device is formed;

at least one color filter formed on the semiconductor substrate;

at least one micro-lens formed on the at least one color filter color filter, respectively,

wherein the micro-lens has a first refractive index equal to or greater than a threshold which is greater than a second refractive index of the at least one color filter,

wherein the at least one color filter comprises a plurality of different color filters having respectively different refractive indexes, and

wherein the threshold is a sum of a threshold difference and a third refractive index of a color filter, among the plurality of different color filters, which is a highest among the different refractive indexes.

6. The image sensor of claim 1 , wherein the micro-lens comprises at least one selected from among metal-added resin, silicon nitride (SiN), plasma silicon oxide (P—SiO), zinc oxide (ZnO), hafnium oxide (HfO), tantalum oxide (TaO), niobium oxide (NbO), zirconium oxide (ZrO), and titanium oxide (TiO).

7. An image sensor module comprising:

the image sensor of claim 1 comprising a plurality of pixels for generating a plurality of pixel signals according to incident light; and

a signal processing circuit configured to output image data based on the plurality of pixel signals.

8. An image processing system comprising:

the image sensor module of claim 7 configured to output the image data; and

a processor configured to process the image data.

9. An image sensor comprising:

a semiconductor substrate in which a photoelectric conversion device is formed;

at least one color filter formed on the semiconductor substrate;

at least one color filter fence formed on the semiconductor substrate and between two neighboring color filters among the at least one color filter; and

at least one micro-lens formed on the at least one color filter, respectively,

wherein the micro-lens has a first refractive index equal to or greater than a first threshold,

wherein the color filter fence has a second refractive index less than or equal to a second threshold,

wherein the second threshold is less than the first threshold.

10. The image sensor of claim 9 , wherein the first refractive index is in a first range of 1.8 to 2.5, and

wherein the second refractive index is in a second range of 1.0 to 1.3.

11. The image sensor of claim 9 , further comprising:

a first flat layer formed on the at least one color filter and below the micro-lens; and

a second flat layer formed on the semiconductor substrate and below the at least one color filter.

12. The image sensor of claim 11 , wherein refractive indexes of the first flat layer the second flat layer are the same as the first refractive index.

13. The image sensor of claim 9 , wherein the first refractive index is greater than a refractive index of the at least one color filter, and

wherein the refractive index of the at least one color filter is greater by a threshold difference or more than the second refractive index.

14. The image sensor of claim 13 , wherein the threshold difference is in a first range of 0.2 to 0.4, and

wherein the refractive index of the at least one color filter is in a second range of 1.5 to 1.7.

15. The image sensor of claim 9 , wherein the color filter fence comprises a porous silica material or an air layer.

16. The image sensor of claim 9 , wherein the at least one color filter comprises a plurality of different color filters having respectively different refractive indexes, and

wherein the first threshold is a sum of a first threshold difference and a refractive index of a color filter, among the plurality of different color filters, which is a highest among the different refractive indexes.

17. The image sensor of claim 9 , wherein the at least one color filter comprises a plurality of different color filters having respectively different refractive indexes, and

wherein the second threshold is less, by a second threshold difference, than a refractive index of a color filter, among the plurality of color filters, which is a lowest among the different refractive indexes.

18. The image sensor of claim 9 , wherein the micro-lens comprises at least one selected from among metal-added resin, silicon nitride (SiN), plasma silicon oxide (P—SiO), zinc oxide (ZnO), hafnium oxide (HfO), tantalum oxide (TaO), niobium oxide (NbO), zirconium oxide (ZrO), and titanium oxide (TiO).

19. An image sensor module comprising:

the image sensor of claim 9 comprising a plurality of pixels for generating a plurality of pixel signals according to incident light; and

a signal processing circuit configured to output image data based on the plurality of pixel signals.

20. An image processing system comprising:

the image sensor module of claim 19 configured to output the image data; and

a processor configured to process the image data.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2015
From: MIYASHITA, NAOYUKI
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 036468/0096 →
Priority Claims (1)
KR 10-2014-0122906 · Sep 16, 2014 · national
Continuity (1)
Related Publication 20160079292A1 · Mar 17, 2016