IP Library Granted Patent US 6,703,171
Granted Patent Utility
US 6,703,171 · Confirmation No. 5379

PHOTOMASK, THE MANUFACTURING METHOD, A PATTERNING METHOD, AND A SEMICONDUCTOR DEVICE MANUFACTURING METHOD

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Code Description Pages PDF
2004-01-26 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-02-12 TRNA Transmittal of New Application 3 View
2002-02-12 A.PE Preliminary Amendment 2 View
2002-02-12 SPEC Specification 86 View
2002-02-12 CLM Claims 9 View
2002-02-12 ABST Abstract 1 View
2002-02-12 DRW Drawings-only black and white line drawings 9 View
2002-02-12 OATH Oath or Declaration filed 4 View
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Quick Facts
Patent No.
US 6,703,171
App. No.
10/072,880
Filed
2002-02-12
Granted
2004-03-09
Pub. No.
US20020094483A1
Art Unit
1756
PTA
-30 days