Granted Patent
Utility
US 6,703,171
· Confirmation No. 5379
PHOTOMASK, THE MANUFACTURING METHOD, A PATTERNING METHOD, AND A SEMICONDUCTOR DEVICE MANUFACTURING METHOD
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2004-01-26 | IFEE |
Issue Fee Payment (PTO-85B) | 1 | View | |
| 2002-02-12 | TRNA |
Transmittal of New Application | 3 | View | |
| 2002-02-12 | A.PE |
Preliminary Amendment | 2 | View | |
| 2002-02-12 | SPEC |
Specification | 86 | View | |
| 2002-02-12 | CLM |
Claims | 9 | View | |
| 2002-02-12 | ABST |
Abstract | 1 | View | |
| 2002-02-12 | DRW |
Drawings-only black and white line drawings | 9 | View | |
| 2002-02-12 | OATH |
Oath or Declaration filed | 4 | View |
Inventors
Takashi Hattori
Musashimurayama, JAPAN
Yasuko Gotoh
Mobara, JAPAN
Hidetoshi Satoh
Hitachinaka, JAPAN
Toshihiko Tanaka
Tokyo, JAPAN
Hiroshi Shiraishi
Hachioji, JAPAN
Attorneys & Agents of Record
Classification
USPC
430/5
H10P76/00
G03F1/32
G03F1/26
G03F1/30
G03F1/56
Prosecution
- Examiner
- ROSASCO, STEPHEN D
- Art Unit
- 1756
- Customer No.
- 24956
- Docket No.
- T&A-109-02
- Confirmation No.
- 5379
Foreign Priority
2000-401154
·
2000-12-28
·
JAPAN
Publication
- Pub. No.
- US20020094483A1
- Pub. Date
- 2002-07-18
Patent Term Adjustment
-30days
CHANGE OF ADDRESS
Recorded 2017-11-29
MERGER AND CHANGE OF NAME
Recorded 2010-09-09
from
HITACHI, LTD.
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-10-15
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Quick Facts
- Patent No.
- US 6,703,171
- App. No.
- 10/072,880
- Filed
- 2002-02-12
- Granted
- 2004-03-09
- Pub. No.
- US20020094483A1
- Examiner
- ROSASCO, STEPHEN D
- Art Unit
- 1756
- PTA
- -30 days
External Links