AC biased conductive brush for eliminating VOC induced LCM
View Patent ↗A cleaning system including: a cleaning device for cleaning laterally conductive deposits from the imaging surface; an AC bias member, adjacent to the imaging surface and positioned downstream from the cleaning device; and a power supply for biasing the AC bias member to generate corona that contacts the imaging surface to degrade laterally conductive deposits that lead to lateral charge migration on the imaging surface.
1. A cleaning system comprising:
a cleaning device for cleaning debris and removing laterally conductive deposits from the imaging surface; said cleaning device includes an abrading brush for uniformly abrading the imaging surface to remove laterally conductive deposits and
a corona generating member, coating with abrading brush, for emitting corona on the imaging surface to degrade laterally the conductive deposits thereon
thereby enhancing removal of laterally conductive deposits.
2. The cleaning system of claim 1 , wherein said abrading brush includes core defining a core length and having fibers extending outwardly therefrom include abrasive particles attached thereto.
3. The cleaning system of claim 2 , wherein said abrading brush includes a region of conductive fibers without abrasive particles attached to the end of said fibers.
4. The cleaning system of claim 3 , wherein said fibers selected from the group fibers consisting of conductive and insulating synthetic fibers including styrene-acrylate, acrylic, nylon, polyethylene, polypropylene, polyester, polystyrene, rayon, polyethylethylketone (PEEK), polyvinylchloride, carbon fiber and natural fibers including tampico, horsehair, palmetto, and palmyra.
5. The cleaning system of claim 3 , wherein said fibers are between 1 denier per fiber and 30 denier per fiber in diameter and between 3 mm and 20 mm in length.
6. The cleaning system of claim 3 , wherein said abrasive particles selected from the group abrasive particles consisting of silicon carbide, aluminum oxide, cerium oxide, iron oxide, cubic boron nitride, garnet, silica, glass, zirconia.
7. The cleaning system of claim 6 , wherein said abrasive particles are between 0.2 microns and 15 microns in size.
8. The cleaning system of claim 1 , wherein the corona generating member includes a core defining a core length and having conductive fibers extending outwardly therefrom and a power supply that applies an AC bias sufficient to generate corona at the ends of the conductive fibers.
9. The cleaning system of claim 8 , wherein said power supply applies an AC bias at a frequency between 100 Hz and 100 kHz and a voltage between 1 kV peak-peak and 5 kV peak-peak.
10. An electrostatic printing machine having a cleaning system comprising:
a cleaning device for cleaning debris and removing laterally conductive deposits from the imaging surface; said cleaning device includes an abrading brush of uniformly abrading the imaging surface to remove laterally conductive deposits and
a corona generating member, coating with abrading brush, for emitting corona on the imaging surface to degrade laterally the conductive deposits thereon
thereby enhancing removal of laterally conductive deposits.
11. The cleaning system of claim 10 , wherein said abrading brush includes core defining a core length and having fibers extending outwardly therefrom including abrasive particles attached to thereto.
12. The cleaning system of claim 11 , wherein said abrading brush includes a region of conductive fibers without abrasive particles attached thereto.
13. The cleaning system of claim 12 , wherein said fibers selected from the group fibers consisting of conductive and insulating synthetic fibers including styrene-acrylate, acrylic, nylon, polyethylene, polypropylene, polyester, polystyrene, rayon, polyethylethylketone (PEEK), polyvinylchloride, carbon fiber and natural fibers including tampico, horsehair, palmetto, palmyra.
14. The cleaning system of claim 12 , wherein said fibers are between 1 denier per fiber and 30 denier per fiber in diameter and between 3 mm and 20 mm in length.
15. The cleaning system of claim 12 , wherein said abrasive particles selected from the group abrasive particles consisting of silicon carbide, aluminum oxide, cerium oxide, iron oxide, cubic boron nitride, garnet, silica, glass, zirconia.
16. The cleaning system of claim 15 , wherein said abrasive particles are between 0.2 microns and 15 microns in size.
17. The cleaning system of claim 10 , wherein the corona generating member includes a core defining a core length and having conductive fibers extending outwardly therefrom and a power supply that applies an AC bias sufficient to generate corona at the ends of the conductive fibers.
18. The cleaning system of claim 17 , wherein said power supply applies an AC bias at a frequency between 100 Hz and 100 kHz and a voltage between 1 kV peak-peak and 5 kV peak-peak.