IP Library Granted Patent US 7,018,771
Granted Patent B2
US 7,018,771 · App. 11/110,784 · Granted Mar 28, 2006

Material transfer method and manufacturing method for substrate for plasma display

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Quick Facts
Patent No.
US 7,018,771
App. No.
11/110,784
Granted
Mar 28, 2006
Kind
B2
Abstract

The present invention provides a highly reliable technology for manufacturing a substrate with protrusions. After filling an UV-curable transfer material into the grooves of an intaglio plate for transfer, the UV-curable transfer material is cured by irradiating UV rays under the conditions where it is exposed to an atmosphere that contains at least one of oxygen and ozone while a curing-inhibited portion is formed in an area of the UV-curable transfer material exposed to this atmosphere, and the UV-curable transfer material is transferred to the substrate to form the protrusions, while the curing-inhibited portion is made to adhere to the substrate.

Claims (8)

1. A material transfer method for transferring a transfer material filled in concave portions of an intaglio plate for transfer onto a substrate, comprising:

preparing an UV-curable transfer material that is not cured in an atmosphere that contains at least one of oxygen and ozone, even if UV rays are irradiated, and that indicates adhesion in an uncured state;

filling said transfer material into the concave portions of said intaglio plate for transfer, and irradiating the UV rays onto said transfer material in said atmosphere that contains one of oxygen and ozone to cure portions other than the portion exposed from said intaglio plate to the atmosphere; and

adhering the uncured area of said transfer material to said substrate and transferring said transfer material to said substrate.

2. The material transfer method according to claim 1 , wherein at least one of said substrate and said intaglio plate for transfer transmits UV rays, the method further comprising curing said uncured area by irradiating UV rays onto said substrate or intaglio plate for transfer in a status where the uncured area of said transfer material adheres to said substrate.

3. The material transfer method according to claim 1 , wherein said transfer material contains a low melting point glass material, photopolymerizable compound and photopolymerization reaction initiator.

4. The material transfer method according to claim 3 , wherein the photopolymerization reaction initiator contained in the transfer material is a radical polymerization initiator.

5. A manufacturing method for a substrate for a plasma display panel, comprising the transfer method according to one of claims 1 to 4 , wherein said transfer material is formed on the substrate as ribs to partition a discharge space.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 22, 2008
From: FUJITSU LIMITED
To: HITACHI, LTD.
Reel/Frame 020840/0056 →
TRUST AGREEMENT REGARDING PATENT RIGHTS, ETC. DATED JULY 27, 2005 AND MEMORANDUM OF UNDERSTANDING REGARDING TRUST DATED MARCH 28, 2007 Recorded Apr 13, 2007
From: HITACHI LTD.
To: HITACHI PLASMA PATENT LICENSING CO., LTD.
Reel/Frame 019147/0847 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 21, 2005
From: TOYODA, OSAMU; INOUE, KAZUNORI; TOKAI, AKIRA
To: FUJITSU LIMITED; ADVANCED PDP DEVELOPMENT CENTER CORPORATION
Reel/Frame 016501/0548 →