Apparatus for the efficient coating of substrates including plasma cleaning
View Patent ↗A process for the coating of substrates comprising insertion of a substrate into a process oven, plasma cleaning of the substrate, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a gas plasma generator, a metered chemical withdrawal subsystem, and a vaporization subsystem.
1. A process for coating of substrates comprising:
inserting a substrate into a process chamber;
plasma cleaning said substrate in the process chamber;
pre-heating a vaporization chamber to a first temperature with a vaporization chamber heater;
pre-determining a first specific volume of liquid silane to be used for the process;
pre-determining a first amount of time to be used for the process;
withdrawing said first specific volume of liquid silane from a first chemical reservoir;
supplying the first specific volume of liquid silane to the heated vaporization chamber, wherein said heated vaporization chamber is fluidically coupled to said process chamber by a passage open continuously while said first specific volume of liquid silane is supplied to said heated vaporization chamber; and
vaporizing said first specific volume of said liquid silane, wherein most of the vapor of said first specific volume of said liquid silane enters said process chamber through the open passageway, whereby some of the vapor of said first specific volume of said liquid silane reacts with the substrate to create a layer;
allowing the vapor of said first specific volume of said liquid silane to remain in the process chamber for a first pre-determined amount of time,
wherein said heated vaporization chamber is fluidically coupled to said process chamber by a passage open continuously during said first pre-determined amount of time, and wherein said process chamber is not evacuated during said first pre-determined amount of time.
2. The process of claim 1 , wherein said first chemical reservoir is a chemical manufacturer's source bottle.
3. The process of claim 1 further comprising dehydrating said substrate in the process chamber prior to reacting the silane with the substrate, wherein said dehydrating a substrate comprises:
evacuating said chamber to a first pressure after said inserting said substrate into said process chamber;
inputting a first heated inert gas into said process chamber;
re-evacuating said process chamber subsequent to said inputting a first gas into said process chamber,
and wherein said plasma cleaning the substrate occurs after said dehydrating said substrate.
4. The process of claim 3 wherein said inert gas is nitrogen.
5. The process of claim 3 wherein said re-evacuating said process chamber evacuates said process chamber to a second pressure.
6. The process of claim 5 wherein said second pressure is lower than said first pressure.
7. The process of claim 1 , wherein said substrate comprises glass.
8. The process of claim 1 wherein said silane is an amino silane.
9. The process of claim 1 wherein said silane is an epoxy silane.
10. The process of claim 1 wherein said silane is a mercapto silane.
11. The process of claim 1 further comprising replacing the lost volume of silane in the first chemical reservoir with an inert gas.
12. The process of claim 11 wherein said inert gas is nitrogen.
13. The process of claim 1 wherein said withdrawing a first volume of liquid silane comprises withdrawing said first volume using a metering pump.