IP Library Patent Application 11156512
Patent Application
App. No. 11/156,512

Method of producing metal-doped silicon-based gel materials

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Quick Facts
Patent No.
US None
App. No.
11/156,512
Filed
Jun 20, 2005
Art Unit
1793
USPC
502/237
Abstract

The present invention relates generally to an environmental control unit for use in air handling systems that provides highly effective filtration of noxious gases (such as ammonia). Such a filtration system utilizes novel metal-doped silica-based gels to trap and remove such undesirable gases from an enclosed environment. Such gels exhibit specific porosity requirements and density measurements. Furthermore, in order for proper metal doping to take effect, such gels must be treated while in a wet state. The combination of these particular properties and metal dopant permits highly effective noxious gas filtration such that uptake and breakthrough results are attained, particularly in comparison with prior silica gel filtration products. Methods of using and specific filter apparatuses are also encompassed within this invention.

Claims (21)

1 . A method of producing metal-doped silicon gel-based particles is provided, said method comprising the sequential steps of:

a) providing a silicon-based gel material;

b) wet reacting said silicon-based gel material with at least one multivalent metal salt to produce metal-doped silicon-based gel material; and

c) drying said multivalent metal-doped silicon-based gel materials.

2 . The method of claim 1 wherein said multivalent metal salt is a salt having a metal selected from the group consisting of cobalt, iron, manganese, zinc, aluminum, chromium, copper, tin, antimony, indium, tungsten, silver, gold, platinum, mercury, palladium, cadmium, nickel, and any combinations thereof.

3 . The method of claim 2 wherein said multivalent metal is copper.

4 . A method of producing metal-doped silicon gel-based particles is provided, said method comprising the sequential steps of:

a) producing a silicon-based gel material;

b) wet reacting said silicon-based gel material with at least one multivalent metal salt to produce metal-doped silicon-based gel material; and

c) drying said multivalent metal-doped silicon-based gel materials.

5 . The method of claim 4 wherein step “a” is performed at a pH level from 1 to 5.

6 . The method of claim 5 wherein step “a” is performed at a pH level equal to or below 2.

7 . The method of claim 5 wherein step “a” is performed at a pH level of from 3 to 4.

8 . The method of claim 4 wherein said multivalent salt is a salt having a metal selected from the group consisting of cobalt, iron, manganese, zinc, aluminum, chromium, copper, tin, antimony, indium, tungsten, silver, gold, platinum, mercury, palladium, cadmium, nickel, and any combinations thereof.

9 . The method of claim 8 wherein said multivalent metal is copper.

10 . The method of claim 5 wherein said multivalent metal salt is a salt having a metal selected from cobalt, iron, manganese, zinc, aluminum, chromium, copper, tin, antimony, indium, tungsten, silver, gold, platinum, mercury, palladium, cadmium, nickel, and any combinations thereof.

11 . The method of claim 10 wherein said multivalent metal is copper.

12 . The method of claim 6 wherein said multivalent metal salt is a salt having a metal selected from cobalt, iron, manganese, zinc, aluminum, chromium, copper, tin, antimony, indium, tungsten, silver, gold, platinum, mercury, palladium, cadmium, nickel, and any combinations thereof.

13 . The method of claim 12 wherein said multivalent metal is copper.

14 . The method of claim 7 wherein said multivalent metal salt is a salt having a metal selected from cobalt, iron, manganese, zinc, aluminum, chromium, copper, tin, antimony, indium, tungsten, silver, gold, platinum, mercury, palladium, cadmium, nickel, and any combinations thereof.

15 . The method of claim 14 wherein said multivalent metal is copper.

Assignments (6)
RELEASE OF SECURITY INTEREST IN PATENT COLLATERAL (SECOND LIEN) Recorded Aug 6, 2014
From: JPMORGAN CHASE BANK, N.A. (AS SUCCESSOR TO BEAR STEARNS CORPORATE LENDING INC.), AS ADMINISTRATIVE AGENT
To: HUNTER DEFENSE TECHNOLOGIES, INC.; HDT EXPEDITIONARY SYSTEMS, INC. (FORMERLY KNOWN AS BASE-X, INC.); HDT TACTICAL SYSTEMS, INC. (FORMERLY KNOWN AS HUNTER MANUFACTURING COMPANY); HDT ROBOTICS, INC. (SUCCESSOR-IN-INTEREST TO KINEA DESIGN, L.L.C.); VERTIGO, INC.
Reel/Frame 033481/0458 →
RELEASE OF SECURITY INTEREST IN PATENT COLLATERAL (FIRST LIEN) Recorded Aug 6, 2014
From: JPMORGAN CHASE BANK, N.A. (AS SUCCESSOR TO BEAR STEARNS CORPORATE LENDING INC.), AS ADMINISTRATIVE AGENT
To: HUNTER DEFENSE TECHNOLOGIES, INC.; HDT EXPEDITIONARY SYSTEMS, INC. (FORMERLY KNOWN AS BASE-X, INC.); HDT TACTICAL SYSTEMS, INC. (FORMERLY KNOWN AS HUNTER MANUFACTURING COMPANY); HDT ROBOTICS, INC. (SUCCESSOR-IN-INTEREST TO KINEA DESIGN, L.L.C.); VERTIGO, INC.
Reel/Frame 033482/0422 →
SECOND LIEN PATENT SECURITY AGREEMENT Recorded Aug 23, 2007
From: HUNTER MANUFACTURING COMPANY
To: BEAR STEARNS CORPORATE LENDING INC., AS SECOND LIEN ADMINISTRATIVE AGENT
Reel/Frame 019733/0711 →
FIRST LIEN PATENT SECURITY AGREEMENT Recorded Aug 23, 2007
From: HUNTER MANUFACTURING COMPANY
To: BEAR STEARNS CORPORATE LENDING INC., AS FIRST LIEN ADMINISTRATIVE AGENT
Reel/Frame 019733/0720 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 9, 2006
From: WITHIAM, MICHAEL C.; SINCLAIR, FITZGERALD A.; FRIDAY, DAVID K.
To: HUNTER MANUFACTURING COMPANY OF OHIO
Reel/Frame 017530/0701 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 9, 2006
From: WITHIAM, MICHAEL C.; SINCLAIR, FITZGERALD A.; FRIDAY, DAVID K.
To: J.M. HUBER CORPORATION
Reel/Frame 017533/0072 →