Semiconductor integrated circuit device
View Patent ↗The present invention provides a semiconductor integrated circuit device having an SRAM in which leak current is reduced. In an SRAM comprising a plurality of memory cells each constructed by a storage in which input and output terminals of two inverter circuits are cross-connected and a selection MOSFET provided between the storage and complementary bit lines and whose gate is connected to a word line, a substrate bias switching circuit is provided. In normal operation, the substrate bias switching circuit supplies a power source voltage to an N-type well in which a P-channel MOSFET of a memory cell is formed and supplies a ground potential of the circuit to a P-type well in which an N-channel MOSFET is formed. In the standby state, the substrate bias switching circuit supplies a predetermined voltage which is lower than the power source voltage and by which a PN junction between the N-type well and the source of the P-channel MOSFET is not forward biased to the N-type well, and supplies a predetermined voltage which is higher than the ground potential and by which a PN junction between the P-type well and the source of the N-channel MOSFET is not forward biased to the P-type well.
1. A semiconductor integrated circuit device comprising:
a plurality of memory cells each comprised of a storage in which input and output terminals of two inverter circuits are cross-connected and a selection MOSFET provided between said storage and complementary bit lines and whose gate is connected to a word line;
an address selection circuit for setting all of word lines to a non-selection level in a standby state where any of writing and reading operations is not performed on said memory cell; and
a substrate bias switching circuit,
wherein in normal operation, said substrate bias switching circuit supplies a power source voltage to an N-type well in which a P-channel MOSFET of a memory cell is formed and supplies a ground potential of the circuit to a P-type well in which an N-channel MOSFET is formed, and
wherein in said standby state, said substrate bias switching circuit supplies to said N-type well a predetermined voltage which is lower than said power source voltage and by which a PN junction between the N-type well and the source of the P-channel MOSFET is not forward biased, and supplies to said P-type well a predetermined voltage which is higher than said ground potential and by which a PN junction between the P-type well and the source of the N-channel MOSFET is not forward biased.
2. The semiconductor integrated circuit device according to claim 1 ,
wherein a load MOSFET is provided between said complementary bit lines and the power source voltage, and
wherein in said standby state, said load MOSFET is turned off.
3. The semiconductor integrated circuit device according to claim 2 ,
wherein said two inverter circuits as components of said memory cell are CMOS inverter circuits, and
wherein said selection MOSFET is an N-channel MOSFET.
4. The semiconductor integrated circuit device according to claim 3 , further comprising a bit line potential control circuit for setting the potential of the complementary bit lines to a voltage lower than the power source voltage in said standby state.
5. The semiconductor integrated circuit device according to claim 4 , wherein the MOSFET as a component of the memory cell has a device size so that gate leak current flowing between the gate and the substrate, source, or drain is larger than channel leak current flowing between the source and the drain.
6. The semiconductor integrated circuit device according to claim 1 , wherein a difference between the power source voltage and said predetennined voltage lower than said power source voltage is less than 0.7V.
7. The semiconductor integrated circuit device according to claim 1 , wherein a difference between the ground potential and said predetermined voltage higher than said ground potential is less than 0.7V.