Photoelectric conversion layer-stacked solid-state imaging element
View Patent ↗A photoelectric conversion layer-stacked solid-state imaging element comprises: a semiconductor substrate having a signal reading circuit formed thereon; at least one layer of photoelectric conversion layer each of which is provided interposed between a common electrode layer and a plurality of pixel electrode layers corresponding to pixels, said at least one layer of photoelectric conversion layer being stacked above the semiconductor substrate via a light shielding layer; and inhibiting structures each of which inhibits a reflected light produced by reflection of incident light on the light shielding layer, the incident light having passed through said at least one layer of photoelectric conversion layer and entered into a pixel, from entering in direction toward adjacent pixels.
1. A photoelectric conversion layer-stacked solid-state imaging element comprising:
a semiconductor substrate having a signal reading circuit formed thereon;
at least one layer of photoelectric conversion layer each of which is provided interposed between a common electrode layer and a plurality of pixel electrode layers corresponding to pixels, each of said pixels having a lower part, said at least one layer of photoelectric conversion layer being stacked above a light shielding layer which is positioned above the semiconductor substrate; and
inhibiting structures below said photoelectric conversion layer adapted to inhibit a reflected light, which is produced by reflection of incident light on the light shielding layer after said light has passed through said at least one layer of photoelectric conversion layer and entered into a pixel, from entering in a direction toward adjacent pixels to the pixel.
2. The photoelectric conversion layer-stacked solid-state imaging element as defined in claim 1 ,
wherein the inhibiting structures comprise shielding walls each of which is erected at a pixel border portion on the light shielding layer.
3. The photoelectric conversion layer-stacked solid-state imaging element as defined in claim 2 ,
wherein the inhibiting structures further comprises concave portions formed on the light shielding layer, in which the sectional shape of the light shielding layer is concave, and each of the concave portions is located at the lower part of each of the pixels.
4. The photoelectric conversion layer-stacked solid-state imaging element as defined in claim 3 ,
wherein each of the concave portions comprises:
a first region having a first depth, corresponding to a periphery portion of each of the pixels; and
a second region having a second depth greater than the first depth, corresponding to a center portion of each of the pixels.
5. The photoelectric conversion layer-stacked solid-state imaging element as defined in claim 3 ,
wherein the concave portions have depths increasing from a center of a light-receiving surface of the solid-state imaging element toward a periphery of the light-receiving surface.
6. The photoelectric conversion layer-stacked solid-state imaging element as defined in claim 1 ,
wherein the inhibiting structures comprise concave portions formed on the light shielding layer, in which the sectional shape of the light shielding layer is concave, and each of the concave portions is located at the lower part of each of the pixels.
7. The photoelectric conversion layer-stacked solid-state imaging element as defined in claim 6 ,
wherein each of the concave portions comprises:
a first region having a first depth, corresponding to a periphery portion of each of the pixels; and
a second region having a second depth greater than the first depth, corresponding to a center portion of each of the pixels.
8. The photoelectric conversion layer-stacked solid-state imaging element as defined in claim 6 ,
wherein the concave portions have depths increasing from a center of a light-receiving surface of the solid-state imaging element toward a periphery of the light-receiving surface.